摘要
The migration of vacancies in diamond is of considerable fundamental interest and has been widely studied previously, while the involvement of self-interstitials in diamond is less common except through centers such as 3H, 515.8 nm, 533.5 nm, and 580 nm. In this paper, the annealing and lateral migration of some interstitial-related centers in type IIa diamond are investigated by low temperature photoluminescence (PL) microscopy, and the distributions of interstitial- and vacancy-related centers are also clearly presented and discussed.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 152101 |
| 期刊 | Applied Physics Letters |
| 卷 | 110 |
| 期 | 15 |
| DOI | |
| 出版状态 | 已出版 - 10 4月 2017 |
学术指纹
探究 'Annealing and lateral migration of defects in IIa diamond created by near-threshold electron irradiation' 的科研主题。它们共同构成独一无二的指纹。引用此
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver