TY - JOUR
T1 - An interface-engineered three-channel synapse using staggered transition metal dichalcogenides/ferroelectric heterojunctions
AU - Zhou, Yuqing
AU - Zeng, Qibin
AU - Fu, Xingke
AU - Yang, Chao
AU - Hou, Feiyan
AU - Ge, Chen
AU - Zeng, Kaiyang
AU - Liu, Huajun
AU - Chai, Zheng
AU - Min, Tai
AU - Li, Tao
N1 - Publisher Copyright:
© 2025 Elsevier B.V.
PY - 2025/12/15
Y1 - 2025/12/15
N2 - Ferroelectric tunnel junctions (FTJs) are widely explored for information storage and neuromorphic computing, typically employing a two-terminal configuration. Integrating additional terminals enhances modulation flexibility, while the interface effects can precisely control the linearity and symmetry of polarization switching dynamics. Here, we fabricated a three-channel FTJ-like device based on 1 T′-MoTe2/2H-MoS2/BaTiO3/La0.7Sr0.3MnO3 heterostructure. The upgraded architecture effectively integrates three independent FTJs into a single device and enables interface effects as additional strategies for polarization modulation. The staggered 1 T′-MoTe2/2H-MoS2 heterostructure as top electrodes precisely controls the ferroelectric polarization switching dynamics by interfacial interactions, including band alignment engineering and interface polarization field, thereby achieving diode, non-volatile memory, and synaptic plasticity functionalities. In addition, distinct lateral charge transfer through the 1 T′-MoTe2/2H-MoS2 interface introduces an additional polarization modulation strategy. Notably, short-term and long-term synaptic plasticity with excellent linearity and symmetry have been achieved, exhibiting optimal non-linearity factors of −0.161/−0.062. These properties enabled the associated neural network to achieve recognition accuracies of 89.74 %, 94.86 %, and 93.02 % in the corresponding three junctions (approaching the 95.44 % ideal accuracy), thereby demonstrating a high-performance synaptic device with three effective channels. These results offer a new design of densely integrated ferroelectric devices with rich tunability, promoting the frontier of artificial synapse-based on-chip in-memory computing.
AB - Ferroelectric tunnel junctions (FTJs) are widely explored for information storage and neuromorphic computing, typically employing a two-terminal configuration. Integrating additional terminals enhances modulation flexibility, while the interface effects can precisely control the linearity and symmetry of polarization switching dynamics. Here, we fabricated a three-channel FTJ-like device based on 1 T′-MoTe2/2H-MoS2/BaTiO3/La0.7Sr0.3MnO3 heterostructure. The upgraded architecture effectively integrates three independent FTJs into a single device and enables interface effects as additional strategies for polarization modulation. The staggered 1 T′-MoTe2/2H-MoS2 heterostructure as top electrodes precisely controls the ferroelectric polarization switching dynamics by interfacial interactions, including band alignment engineering and interface polarization field, thereby achieving diode, non-volatile memory, and synaptic plasticity functionalities. In addition, distinct lateral charge transfer through the 1 T′-MoTe2/2H-MoS2 interface introduces an additional polarization modulation strategy. Notably, short-term and long-term synaptic plasticity with excellent linearity and symmetry have been achieved, exhibiting optimal non-linearity factors of −0.161/−0.062. These properties enabled the associated neural network to achieve recognition accuracies of 89.74 %, 94.86 %, and 93.02 % in the corresponding three junctions (approaching the 95.44 % ideal accuracy), thereby demonstrating a high-performance synaptic device with three effective channels. These results offer a new design of densely integrated ferroelectric devices with rich tunability, promoting the frontier of artificial synapse-based on-chip in-memory computing.
KW - Diode
KW - Interface effect
KW - Multistate memory
KW - TMD/ferroelectric heterostructure
KW - Three-channel synapse
UR - https://www.scopus.com/pages/publications/105022239510
U2 - 10.1016/j.cej.2025.171003
DO - 10.1016/j.cej.2025.171003
M3 - 文章
AN - SCOPUS:105022239510
SN - 1385-8947
VL - 526
JO - Chemical Engineering Journal
JF - Chemical Engineering Journal
M1 - 171003
ER -