摘要
The fabrication of thin film transistors (TFT) on metal and plastic substrates and their subsequent plastic deformation was reported. The TFTs fabricated on patterned silicon nitride islands on polyimide substrates were shown to have reduced strain in the semiconductor islands. The devices retained their characteristics after the deformation as the carrier mobility and threshold voltage changed only nominally.
| 源语言 | 英语 |
|---|---|
| 页 | 193-194 |
| 页数 | 2 |
| 出版状态 | 已出版 - 2001 |
| 已对外发布 | 是 |
| 活动 | Device Research Conference (DRC) - Notre Dame, IN, 美国 期限: 25 6月 2001 → 27 6月 2001 |
会议
| 会议 | Device Research Conference (DRC) |
|---|---|
| 国家/地区 | 美国 |
| 市 | Notre Dame, IN |
| 时期 | 25/06/01 → 27/06/01 |
学术指纹
探究 'Amorphous Si TFTs on plastically-deformed substrates with 3-D shapes' 的科研主题。它们共同构成独一无二的指纹。引用此
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