摘要
There is a growing interest in the design and fabrication of flexible and rugged electronics particularly for large-area displays and sensor arrays. In this work, we describe the fabrication of amorphous silicon (a-Si:H) thin film transistors (TFTs) on a Kapton® substrate which can be permanently deformed into a spherical cap shape. This level of strain would crack uniform a-Si:H device films. To prevent fractures in our TFT structure, the silicon and silicon nitride layers of the TFTs are patterned to create isolated device islands. After deformation, these brittle islands can remain crack-free, and the TFTs achieve comparable device behavior despite average strain in the substrate in excess of 5%.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 1355-1359 |
| 页数 | 5 |
| 期刊 | Journal of Non-Crystalline Solids |
| 卷 | 299-302 |
| 期 | PART 2 |
| DOI | |
| 出版状态 | 已出版 - 4月 2002 |
| 已对外发布 | 是 |
学术指纹
探究 'Amorphous Si TFTs on plastically deformed spherical domes' 的科研主题。它们共同构成独一无二的指纹。引用此
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