摘要
A vertical top-gate multichannel vacuum triode (TG-MVT) with a 50-nm channel size is proposed and fabricated using IC-compatible manufacturing techniques. By employing a unique multichannel gate-surrounding structure, a low subthreshold swing (SS) of 58.9 mV/dec is achieved. In addition, the proposed TG-MVT device exhibits a low turn-on voltage of 0.6 V and achieves a high emission current of 20 —A with a large current on/off ratio of 8e4 at 1.8 V drain voltage. The role of the top-gate surrounding structure in field emission tunneling and the electron transport mechanism is clarified through the theoretical analysis. Meanwhile, a theoretical scheme for the design optimization of the device toward nanoscale miniaturization is presented. This article provides a novel technical approach for the development of low-power and high-performance nanoscale channel vacuum electronic devices.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 3023-3028 |
| 页数 | 6 |
| 期刊 | IEEE Transactions on Electron Devices |
| 卷 | 73 |
| 期 | 5 |
| DOI | |
| 出版状态 | 已出版 - 1 5月 2026 |
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