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A self-limited large-displacement-ratio micromechanical amplifier

  • J. Li
  • , Z. S. Liu
  • , C. Lu
  • , Q. X. Zhang
  • , A. Q. Liu
  • Nanyang Technological University
  • Agency for Science, Technology and Research, Singapore

科研成果: 书/报告/会议事项章节会议稿件同行评审

3 引用 (Scopus)

摘要

A micromechanical amplifier with large-displacement-ratio and self-limited output as a result of bifurcation effect is reported in this paper. The large output displacement is achieved by amplifying a small input motion through the elastic deformation of the compliant configuration, which realizes the self-limited output by bifurcation effect. The configuration of the compliant microstructures is analyzed with the results of as high as 100 times displacement magnification and self-limitation by bifurcation effect, Such kind of amplifier is fabricated by employing deep reactive ion etching (DRIE) process demonstrating the 52.0-μm-output displacement when the input displacement is only 0.96 um with the displacement ratio of 54.2. Thereafter, the output displacement maintains stable due to the bifurcation effect.

源语言英语
主期刊名TRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
725-728
页数4
DOI
出版状态已出版 - 2005
已对外发布
活动13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, 韩国
期限: 5 6月 20059 6月 2005

出版系列

姓名Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
1

会议

会议13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
国家/地区韩国
Seoul
时期5/06/059/06/05

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