A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory

J. J. Diao; M. G. Xia

doi:10.1016/j.colsurfa.2008.12.030

A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory

J. J. Diao
, M. G. Xia

物理学院

University of Illinois at Urbana-Champaign

科研成果: 期刊稿件 › 文章 › 同行评审

17 引用（Scopus）

摘要

In this paper, we present a theoretical discussion about colloidal particles transporting to a meniscus deposition region for the vertical evaporation-driven colloidal deposition by the coffee-ring theory. The vertically immersed substrate is gradually exposed with a low speed, and colloidal particles are deposited on the substrate as suspension surface descends. Due to a singular evaporation rate at the contact line, to keep a constant contact angle, a solvent flow toward the meniscus region is formed to replenish lost liquid. This solvent flow results in a particle flow to form a film on the substrate.

源语言	英语
页（从-至）	167-170
页数	4
期刊	Colloids and Surfaces A: Physicochemical and Engineering Aspects
卷	338
期	1-3
DOI	https://doi.org/10.1016/j.colsurfa.2008.12.030
出版状态	已出版 - 15 4月 2009

访问文件

10.1016/j.colsurfa.2008.12.030

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{6adafa8cf01c4d4da11bea13156ee8db,

title = "A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory",

abstract = "In this paper, we present a theoretical discussion about colloidal particles transporting to a meniscus deposition region for the vertical evaporation-driven colloidal deposition by the coffee-ring theory. The vertically immersed substrate is gradually exposed with a low speed, and colloidal particles are deposited on the substrate as suspension surface descends. Due to a singular evaporation rate at the contact line, to keep a constant contact angle, a solvent flow toward the meniscus region is formed to replenish lost liquid. This solvent flow results in a particle flow to form a film on the substrate.",

keywords = "Coffee ring, Colloidal particles, Evaporation, Film growth, Self-assembly, Vertical evaporation-driven colloidal deposition",

author = "Diao, \{J. J.\} and Xia, \{M. G.\}",

year = "2009",

month = apr,

day = "15",

doi = "10.1016/j.colsurfa.2008.12.030",

language = "英语",

volume = "338",

pages = "167--170",

journal = "Colloids and Surfaces A: Physicochemical and Engineering Aspects",

issn = "0927-7757",

publisher = "Elsevier B.V.",

number = "1-3",

}

TY - JOUR

T1 - A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory

AU - Diao, J. J.

AU - Xia, M. G.

PY - 2009/4/15

Y1 - 2009/4/15

N2 - In this paper, we present a theoretical discussion about colloidal particles transporting to a meniscus deposition region for the vertical evaporation-driven colloidal deposition by the coffee-ring theory. The vertically immersed substrate is gradually exposed with a low speed, and colloidal particles are deposited on the substrate as suspension surface descends. Due to a singular evaporation rate at the contact line, to keep a constant contact angle, a solvent flow toward the meniscus region is formed to replenish lost liquid. This solvent flow results in a particle flow to form a film on the substrate.

AB - In this paper, we present a theoretical discussion about colloidal particles transporting to a meniscus deposition region for the vertical evaporation-driven colloidal deposition by the coffee-ring theory. The vertically immersed substrate is gradually exposed with a low speed, and colloidal particles are deposited on the substrate as suspension surface descends. Due to a singular evaporation rate at the contact line, to keep a constant contact angle, a solvent flow toward the meniscus region is formed to replenish lost liquid. This solvent flow results in a particle flow to form a film on the substrate.

KW - Coffee ring

KW - Colloidal particles

KW - Evaporation

KW - Film growth

KW - Self-assembly

KW - Vertical evaporation-driven colloidal deposition

UR - https://www.scopus.com/pages/publications/60649101021

U2 - 10.1016/j.colsurfa.2008.12.030

DO - 10.1016/j.colsurfa.2008.12.030

M3 - 文章

AN - SCOPUS:60649101021

SN - 0927-7757

VL - 338

SP - 167

EP - 170

JO - Colloids and Surfaces A: Physicochemical and Engineering Aspects

JF - Colloids and Surfaces A: Physicochemical and Engineering Aspects

IS - 1-3

ER -

A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory

摘要

访问文件

其它文件与链接

学术指纹

引用此