TY - GEN
T1 - A novel piezoresistive sensitive structure for micromachined high-pressure sensors
AU - Guo, Xin
AU - Hebibul, Rahman
AU - Jiang, Zhuangde
AU - Zhao, Libo
AU - Xu, Tingzhong
AU - Zhao, Zhiming
AU - Li, Zhikang
AU - Xu, Yu
AU - Gao, Wendi
N1 - Publisher Copyright:
© 2017 IEEE.
PY - 2017/8/25
Y1 - 2017/8/25
N2 - A novel piezoresistive sensitive structure for micromachined high-pressure sensors is proposed. This structure employs several small cavities in a silicon bulk. When high pressure applied on all faces of the bulk, stress emerges between two cavities. The calculation for the variation of the resistance caused by stress in three-dimensional (3D) structure was discussed. According to 3D piezoresistive effect, the performance of the sensitivity and nonlinearity affected by the dimensions of cavity structure had been clarified. The simulation results show the optimized position for the resistance is in lower region. This sensitive structure is suitable for micromachined high-pressure sensors and the performance study set a guideline for designing micromachined high-pressure sensors with multi-cavities working in different range.
AB - A novel piezoresistive sensitive structure for micromachined high-pressure sensors is proposed. This structure employs several small cavities in a silicon bulk. When high pressure applied on all faces of the bulk, stress emerges between two cavities. The calculation for the variation of the resistance caused by stress in three-dimensional (3D) structure was discussed. According to 3D piezoresistive effect, the performance of the sensitivity and nonlinearity affected by the dimensions of cavity structure had been clarified. The simulation results show the optimized position for the resistance is in lower region. This sensitive structure is suitable for micromachined high-pressure sensors and the performance study set a guideline for designing micromachined high-pressure sensors with multi-cavities working in different range.
KW - 3D piezoresistive effect
KW - micromachined high pressure
KW - piezoresistive sensitive structure
KW - resistance arrangement
UR - https://www.scopus.com/pages/publications/85030868583
U2 - 10.1109/NEMS.2017.8017123
DO - 10.1109/NEMS.2017.8017123
M3 - 会议稿件
AN - SCOPUS:85030868583
T3 - 2017 IEEE 12th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017
SP - 728
EP - 731
BT - 2017 IEEE 12th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017
Y2 - 9 April 2017 through 12 April 2017
ER -