摘要
We present here a method for cleaning intermediate-size (up to 50nm) contamination from highly oriented pyrolytic graphite and graphene. Electron-beam-induced deposition of carbonaceous material on graphene and graphite surfaces inside a scanning electron microscope, which is difficult to remove by conventional techniques, can be removed by direct mechanical wiping using a graphite nanoeraser, thus drastically reducing the amount of contamination. We discuss potential applications of this cleaning procedure.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 265706 |
| 期刊 | Nanotechnology |
| 卷 | 22 |
| 期 | 26 |
| DOI | |
| 出版状态 | 已出版 - 1 7月 2011 |
| 已对外发布 | 是 |
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