Abstract
The surface composition of GaN grown by plasma-assisted MBE was investigated using X-ray photoelectron spectroscopy and Auger election emission spectroscopy(AES), while the depth profile was analyzed by AES with Ar iron sputtering. The experimental results indicated that unintentional doped semi-in salating films formed by plasma-assisted MBE had a rich-gallium surface. It was found that the impurity carbon was chiefly adsorbed onto the surface while oxygen diffused into the bulk to distribute in a certain depth. Consequendy, the oxygen-related impurity band and an acceptor level could be simultaneously formed in the layer. This influenced the optical and electrical properties of the films.
| Original language | English |
|---|---|
| Pages (from-to) | 2432-2433 |
| Number of pages | 2 |
| Journal | Wuli Xuebao/Acta Physica Sinica |
| Volume | 50 |
| Issue number | 12 |
| State | Published - Dec 2001 |
Keywords
- AES
- GaN film
- Surface analysis
- XPS
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