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XPS and AES investigation of GaN films grown by MBE

  • Jin She Yuan
  • , Guang De Chen
  • , Ming Qi
  • , Ai Zhen Li
  • , Zhuo Xu
  • Xi'an Jiaotong University
  • Xi'an University of Technology
  • CAS - Shanghai Institute of Microsystem and Information Technology

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The surface composition of GaN grown by plasma-assisted MBE was investigated using X-ray photoelectron spectroscopy and Auger election emission spectroscopy(AES), while the depth profile was analyzed by AES with Ar iron sputtering. The experimental results indicated that unintentional doped semi-in salating films formed by plasma-assisted MBE had a rich-gallium surface. It was found that the impurity carbon was chiefly adsorbed onto the surface while oxygen diffused into the bulk to distribute in a certain depth. Consequendy, the oxygen-related impurity band and an acceptor level could be simultaneously formed in the layer. This influenced the optical and electrical properties of the films.

Original languageEnglish
Pages (from-to)2432-2433
Number of pages2
JournalWuli Xuebao/Acta Physica Sinica
Volume50
Issue number12
StatePublished - Dec 2001

Keywords

  • AES
  • GaN film
  • Surface analysis
  • XPS

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