W-Si-N Nan-Crystal as Electron Emitter Applied in SED

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Abstract

As the most potential next-generation display technology, SED(Surface-conduction Electron-emitter Display) whose independent electron emission character and good image quality draw much attention. Because of the higher emission efficiency than ZnO or PdO in the same craftwork, W-Si-N was selected as electron emitter material applied in SED. In this work, we developed SED with W-Si-N electron emitter film through magnetron sputtering and photoetching technology. We have found that W-Si-N thin film has high luminescent performance. WN and Si3N4 were found in W-Si-N film according to the results of XRD (X-Ray Diffraction) and XPS (X-ray photoelectron spectroscopy). Moreover, the obvious negative resistance effect based on the electron tunneling was observed in the nano-gap formulating process. Crystal boundary, defects, and impure particle affect electron emission efficiency. Besides, we have investigated the fabricating parameters, crystal structure and electron emitting characteristics and obtained the highest emission efficiency∼4.3%.

Original languageEnglish
Title of host publication18th International Vacuum Congress, IVC 2010
EditorsFeng Pan, Xu Chen
PublisherElsevier B.V.
Pages389-394
Number of pages6
ISBN (Electronic)9781627487481
DOIs
StatePublished - 2012
Event18th International Vacuum Congress, IVC 2010 - Beijing, China
Duration: 23 Aug 201027 Aug 2010

Publication series

NamePhysics Procedia
Volume32
ISSN (Print)1875-3884
ISSN (Electronic)1875-3892

Conference

Conference18th International Vacuum Congress, IVC 2010
Country/TerritoryChina
CityBeijing
Period23/08/1027/08/10

Keywords

  • W-Si-N thin film
  • electron-emitter
  • nanocrystal structure
  • surface conduct

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