@inproceedings{7b9429cdd2e9488f968df449f927a74e,
title = "UV-assisted thermal imprint of SU-8 using nickel mold",
abstract = "As an epoxy-based negative photoresist, SU-8 is being widely used for various permanent use MEMS devices due to its excellent thermal and chemical stability. Due to its UV curability, classical structuring methods of SU-8 are based on UV photolithography and UV imprint processes. This study describes a process to form a micro pattern in SU-8 film that is based on thermal imprinting. One of major obstacles in the process is that SU-8 is easy to deform during and after releasing a mold because the mold is separated from the SU-8 in the un-cured state. In this study, series of imprint tests using a Ni m old were performed with the un-cured SU-8 samples pre-treated with UV light for different exposure time, and their results were compared each other in terms of the replication quality. As a result, a SU-8 sample pre-treated with UV light for 8 s resulted in the best replication quality for given imprint conditions, and we could successfully replicate micro patterns with the aspect ratio of 2.5 (25 μm depth and 10 μ line-and-spacing) in SU-8 resist.",
keywords = "Micro pattern, Ni mold, SU-8, Surface pre-treatment, UV-assisted thermal imprint",
author = "Youn, \{Sung Won\} and Akihisa Ueno and Masaharu Takahashi and Ryutaro Maeda",
year = "2008",
doi = "10.1109/ICSMA.2008.4505559",
language = "英语",
isbn = "899500388X",
series = "ICSMA 2008 - International Conference on Smart Manufacturing Application",
pages = "389--392",
booktitle = "ICSMA 2008 - International Conference on Smart Manufacturing Application",
note = "International Conference on Smart Manufacturing Application, ICSMA 2008 ; Conference date: 09-04-2008 Through 11-04-2008",
}