TiN films fabricated by reactive gas pulse sputtering: A hybrid design of multilayered and compositionally graded structures

Jijun Yang; Feifei Zhang; Qiang Wan; Chenyang Lu; Mingjing Peng; Jiali Liao; Yuanyou Yang; Lumin Wang; Ning Liu

doi:10.1016/j.apsusc.2016.07.062

TiN films fabricated by reactive gas pulse sputtering: A hybrid design of multilayered and compositionally graded structures

Jijun Yang
, Feifei Zhang
, Qiang Wan
, Chenyang Lu
, Mingjing Peng
, Jiali Liao
, Yuanyou Yang
, Lumin Wang
, Ning Liu

Sichuan University
University of Michigan, Ann Arbor
China Academy of Engineering Physics

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Reactive gas pulse (RGP) sputtering approach was used to prepare TiN thin films through periodically changing the N ₂ /Ar gas flow ratio. The obtained [Formula presented] film possessed a hybrid architecture containing compositionally graded and multilayered structures, composed of hcp Ti-phase and fcc TiN-phase sublayers. Meanwhile, the RGP-TiN film exhibited a composition-oscillation along the film thickness direction, where the Ti-phase sublayer had a compositional gradient and the TiN-phase retained a constant stoichiometric ratio of Ti:N ≈ 1. The film modulation ratio λ (the thicknesses ratio of the Ti and TiN-phase sublayer) can be effectively tuned by controlling the undulation behavior of the N ₂ partial flow rate. Detailed analysis showed that this hybrid structure originated from a periodic transition of the film growth mode during the reactive sputtering process.

Original language	English
Pages (from-to)	255-259
Number of pages	5
Journal	Applied Surface Science
Volume	389
DOIs	https://doi.org/10.1016/j.apsusc.2016.07.062
State	Published - 15 Dec 2016
Externally published	Yes

Keywords

Composition-oscillation
Gradient
Multilayer
RGP
Reactive sputtering
TiN film

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10.1016/j.apsusc.2016.07.062

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@article{99a774310ba6424cba34e81168047f40,

title = "TiN films fabricated by reactive gas pulse sputtering: A hybrid design of multilayered and compositionally graded structures",

abstract = " Reactive gas pulse (RGP) sputtering approach was used to prepare TiN thin films through periodically changing the N 2 /Ar gas flow ratio. The obtained [Formula presented] film possessed a hybrid architecture containing compositionally graded and multilayered structures, composed of hcp Ti-phase and fcc TiN-phase sublayers. Meanwhile, the RGP-TiN film exhibited a composition-oscillation along the film thickness direction, where the Ti-phase sublayer had a compositional gradient and the TiN-phase retained a constant stoichiometric ratio of Ti:N ≈ 1. The film modulation ratio λ (the thicknesses ratio of the Ti and TiN-phase sublayer) can be effectively tuned by controlling the undulation behavior of the N 2 partial flow rate. Detailed analysis showed that this hybrid structure originated from a periodic transition of the film growth mode during the reactive sputtering process.",

keywords = "Composition-oscillation, Gradient, Multilayer, RGP, Reactive sputtering, TiN film",

author = "Jijun Yang and Feifei Zhang and Qiang Wan and Chenyang Lu and Mingjing Peng and Jiali Liao and Yuanyou Yang and Lumin Wang and Ning Liu",

note = "Publisher Copyright: {\textcopyright} 2016 Elsevier B.V.",

year = "2016",

month = dec,

day = "15",

doi = "10.1016/j.apsusc.2016.07.062",

language = "英语",

volume = "389",

pages = "255--259",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - TiN films fabricated by reactive gas pulse sputtering

T2 - A hybrid design of multilayered and compositionally graded structures

AU - Yang, Jijun

AU - Zhang, Feifei

AU - Wan, Qiang

AU - Lu, Chenyang

AU - Peng, Mingjing

AU - Liao, Jiali

AU - Yang, Yuanyou

AU - Wang, Lumin

AU - Liu, Ning

PY - 2016/12/15

Y1 - 2016/12/15

N2 - Reactive gas pulse (RGP) sputtering approach was used to prepare TiN thin films through periodically changing the N 2 /Ar gas flow ratio. The obtained [Formula presented] film possessed a hybrid architecture containing compositionally graded and multilayered structures, composed of hcp Ti-phase and fcc TiN-phase sublayers. Meanwhile, the RGP-TiN film exhibited a composition-oscillation along the film thickness direction, where the Ti-phase sublayer had a compositional gradient and the TiN-phase retained a constant stoichiometric ratio of Ti:N ≈ 1. The film modulation ratio λ (the thicknesses ratio of the Ti and TiN-phase sublayer) can be effectively tuned by controlling the undulation behavior of the N 2 partial flow rate. Detailed analysis showed that this hybrid structure originated from a periodic transition of the film growth mode during the reactive sputtering process.

AB - Reactive gas pulse (RGP) sputtering approach was used to prepare TiN thin films through periodically changing the N 2 /Ar gas flow ratio. The obtained [Formula presented] film possessed a hybrid architecture containing compositionally graded and multilayered structures, composed of hcp Ti-phase and fcc TiN-phase sublayers. Meanwhile, the RGP-TiN film exhibited a composition-oscillation along the film thickness direction, where the Ti-phase sublayer had a compositional gradient and the TiN-phase retained a constant stoichiometric ratio of Ti:N ≈ 1. The film modulation ratio λ (the thicknesses ratio of the Ti and TiN-phase sublayer) can be effectively tuned by controlling the undulation behavior of the N 2 partial flow rate. Detailed analysis showed that this hybrid structure originated from a periodic transition of the film growth mode during the reactive sputtering process.

KW - Composition-oscillation

KW - Gradient

KW - Multilayer

KW - RGP

KW - Reactive sputtering

KW - TiN film

UR - https://www.scopus.com/pages/publications/84979516816

U2 - 10.1016/j.apsusc.2016.07.062

DO - 10.1016/j.apsusc.2016.07.062

M3 - 文章

AN - SCOPUS:84979516816

SN - 0169-4332

VL - 389

SP - 255

EP - 259

JO - Applied Surface Science

JF - Applied Surface Science

ER -

TiN films fabricated by reactive gas pulse sputtering: A hybrid design of multilayered and compositionally graded structures

Abstract

Keywords

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