Thermal management strategies for gallium oxide vertical trench-fin MOSFETs

  • Robert H. Montgomery
  • , Yuewei Zhang
  • , Chao Yuan
  • , Samuel Kim
  • , Jingjing Shi
  • , Takeki Itoh
  • , Akhil Mauze
  • , Satish Kumar
  • , James Speck
  • , Samuel Graham

Research output: Contribution to journalArticlepeer-review

37 Scopus citations

Abstract

Trench-fin MOSFETs, with their near-surface heat generation and the higher-surface area afforded by their geometry for thermal management, represent a promising solution to the thermal problems frequently encountered in lateral β-Ga2O3 devices. Here, we investigate potential thermal-management strategies for a vertical β-Ga2O3 trench-fin MOSFET through parametric analysis, offering recommendations on how best to design a device for maximal current density and excellent thermal performance. Primarily, by using a thermally conductive dielectric over the MOSFET structure, significant improvements to device power density may be achieved, aided by thermal spreading. Additionally, we find that by bonding thermal spreaders to its topside can yield significant improvements in thermal performance.

Original languageEnglish
Article number085301
JournalJournal of Applied Physics
Volume129
Issue number8
DOIs
StatePublished - 28 Feb 2021

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