The screen printed nano-SiC film for field emission

  • Xiuxia Zhang
  • , Shuyi Wei
  • , Bingheng Lu
  • , Changchun Zhu
  • , Xiaoe Wang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

In this paper, the low-cost screen printed method was adopted preparation uniform nano-SiC films on large areas of glass. The reunited nano-SiC was dispersed by ultrasonic before fabricating paste. After fabricating paste, the nano-SiC was further ultrasonic dispersed. The nano-SiC paste was screen printed on glass. Then nano-SiC films was sintered by the furnace controlled artificial intelligence, the anneal test was take to improve the field emission characteristics. The samples of nano-SiC film were micro-analyzed and tested the I-V characteristics. After above experiments and technics, the uniformity and stability of field emission characteristics for nano-SiC film was obtained.

Original languageEnglish
Title of host publicationTechnical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009
Pages27-28
Number of pages2
DOIs
StatePublished - 2009
Event2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009 - Hamamatsu, Japan
Duration: 20 Jul 200924 Jul 2009

Publication series

NameTechnical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009

Conference

Conference2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009
Country/TerritoryJapan
CityHamamatsu
Period20/07/0924/07/09

Keywords

  • Field emission
  • I-V characteristics
  • Nano-SiC
  • Screen printed mothed

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