Abstract
To efficiently manufacture high-aspect-ratio micro−/nanopatterns of conducting polymers (CPs) via electrohydrodynamic patterning (EHDP), a soluble oligomerpyrrole derivative was synthesized through the method of side-chain-induced solubilization. The oligomerpyrrole derivative shows a low number-average molecular weight (M n ) of 5674 due to the hindering effect of its bulky side chains and then exhibits excellent solubility, favorable film-forming ability and good thermal stability. It is found that because of the low viscosity and leaky dielectric property, a variety of high-aspect-ratio micro−/nanopatterns of the oligomerpyrrole derivative can be rapidly manufactured directly on a conductive substrate via changing the spacing of the air clearance of EHDP. This technique successfully provides a straightforward, economical and contactless way for patterning CP films into a series of high-aspect-ratio micro−/nanopatterns utilizing only a low-aspect-ratio mold.
| Original language | English |
|---|---|
| Pages (from-to) | 116-122 |
| Number of pages | 7 |
| Journal | Reactive and Functional Polymers |
| Volume | 137 |
| DOIs | |
| State | Published - Apr 2019 |
Keywords
- Conducting polymer
- Electrohydrodynamic patterning
- High aspect ratio
- Leaky dielectric
- Soluble oligomerpyrrole
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