Superior Deep-Ultraviolet Source Pumped by an Electron Beam for NLOS Communication

Deep-ultraviolet (DUV) light ranging from 200 to 280 nm, that is, a solar-blind region, has been widely applied to water purification, sterilization, and integrated biosensors. As the light source for nonline-of-sight (NLOS) communication, DUV light has the natural advantage of a negligible background due to strong ozone absorption. However, the existing DUV sources suffer from either low power or low modulation frequency. Here, we demonstrate a DUV source pumped by an electron beam (EB) at 246 nm with a record-high performance for NLOS communication, that is, a simultaneous continuous-wave output power of 430 mW and a modulation frequency of 5 MHz. Significantly, both the output power and the modulation frequency can be further improved when the horsepower of EBs is fully released. Not only does the proposed DUV source show great capability for NLOS communication and other potential applications, but the EB pumping approach can also be extended to various emission processes.