TY - GEN
T1 - Study on Laser-induced Plasma under Vacuum based on PIC Simulation
AU - Lu, Yanqing
AU - Cao, Pei
AU - Gao, Kai
AU - Liu, Jiaqi
AU - Ding, Xiaokang
AU - Yuan, Huan
AU - Yang, Aijun
AU - Wang, Xiaohua
AU - Rong, Mingzhe
N1 - Publisher Copyright:
© 2025 IEEE.
PY - 2025
Y1 - 2025
N2 - The characteristics of laser-induced plasma exhibit considerable potential for industrial applications in fields such as electrical engineering, environmental monitoring, medical and health sciences, and laser processing, thereby demonstrating significant research value. However, current understanding of the formation and evolution mechanisms of laser-induced plasma remains limited. It is well recognized that both the initial plasma parameters and external environmental conditions play critical roles in determining the behavior of laser-induced plasma. In this study, a numerical model of laser-induced plasma under vacuum conditions was established based on the Particle-in-Cell (PIC) method using the VSim simulation software. The model investigates the dynamic processes of laser-plasma interaction and the associated diffusion characteristics. A two-dimensional spatial domain coupled with three-dimensional momentum space was constructed to simulate the evolution of the pre-formed plasma generated by the interaction between laser pulses and a copper target. To address the challenge of representing an infinite physical space within a finite computational domain, absorbing boundary conditions and the Perfectly Matched Layer (PML) technique were implemented. Convergence verification and validation of the PML absorption coefficients were also conducted to ensure the stability and accuracy of the numerical computations. The simulation results indicate that the proposed model is capable of effectively capturing the early-stage evolution of laser-induced plasma. These findings offer theoretical support for the advancement and application of laser-induced plasma technologies in electrical engineering and related disciplines.
AB - The characteristics of laser-induced plasma exhibit considerable potential for industrial applications in fields such as electrical engineering, environmental monitoring, medical and health sciences, and laser processing, thereby demonstrating significant research value. However, current understanding of the formation and evolution mechanisms of laser-induced plasma remains limited. It is well recognized that both the initial plasma parameters and external environmental conditions play critical roles in determining the behavior of laser-induced plasma. In this study, a numerical model of laser-induced plasma under vacuum conditions was established based on the Particle-in-Cell (PIC) method using the VSim simulation software. The model investigates the dynamic processes of laser-plasma interaction and the associated diffusion characteristics. A two-dimensional spatial domain coupled with three-dimensional momentum space was constructed to simulate the evolution of the pre-formed plasma generated by the interaction between laser pulses and a copper target. To address the challenge of representing an infinite physical space within a finite computational domain, absorbing boundary conditions and the Perfectly Matched Layer (PML) technique were implemented. Convergence verification and validation of the PML absorption coefficients were also conducted to ensure the stability and accuracy of the numerical computations. The simulation results indicate that the proposed model is capable of effectively capturing the early-stage evolution of laser-induced plasma. These findings offer theoretical support for the advancement and application of laser-induced plasma technologies in electrical engineering and related disciplines.
KW - laser induced plasma
KW - particle simulation
KW - pondermotive force
UR - https://www.scopus.com/pages/publications/105032125624
U2 - 10.1109/AEET66561.2025.11307054
DO - 10.1109/AEET66561.2025.11307054
M3 - 会议稿件
AN - SCOPUS:105032125624
T3 - 2025 International Conference on Applied Electrical Engineering and Technology, AEET 2025
SP - 145
EP - 150
BT - 2025 International Conference on Applied Electrical Engineering and Technology, AEET 2025
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2025 International Conference on Applied Electrical Engineering and Technology, AEET 2025
Y2 - 29 August 2025 through 31 August 2025
ER -