Study of the initial aluminide phase growth in Al/Pt couples

X. A. Zhao; E. Ma; H. Y. Yang; M. A. Nicolet

doi:10.1016/0040-6090(87)90198-2

Study of the initial aluminide phase growth in Al/Pt couples

X. A. Zhao
, E. Ma
, H. Y. Yang
, M. A. Nicolet

California Institute of Technology

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The thermal reaction of thin platinum films with large-grained aluminum substrates is studied with emphasis on the growth kinetics of the initial aluminide phase. In situ d.c. sputter cleaning is performed on the large-grained aluminum substrates before the platinum film is evaporated to ensure a clean interface. Uniform layer-by-layer growth of Pt₂Al₃ is observed and monitored by 2 MeV⁴He⁺ backscattering. The thickness x of this initial aluminide phase grows parabolically with the annealing duration t as x² = Kt. After the incubation period, the growth constant K is given by K = x² t = 8.76exp- 1.45 eV k_BT (cm²s^-1) for 255°C < T < 305°C.

Original language	English
Pages (from-to)	379-385
Number of pages	7
Journal	Thin Solid Films
Volume	153
Issue number	1-3
DOIs	https://doi.org/10.1016/0040-6090(87)90198-2
State	Published - 26 Oct 1987
Externally published	Yes

Access to Document

10.1016/0040-6090(87)90198-2

Cite this

@article{96e94252e19d472b9183bbacddd15083,

title = "Study of the initial aluminide phase growth in Al/Pt couples",

abstract = "The thermal reaction of thin platinum films with large-grained aluminum substrates is studied with emphasis on the growth kinetics of the initial aluminide phase. In situ d.c. sputter cleaning is performed on the large-grained aluminum substrates before the platinum film is evaporated to ensure a clean interface. Uniform layer-by-layer growth of Pt2Al3 is observed and monitored by 2 MeV4He+ backscattering. The thickness x of this initial aluminide phase grows parabolically with the annealing duration t as x2 = Kt. After the incubation period, the growth constant K is given by K = x2 t = 8.76exp- 1.45 eV kBT (cm2s-1) for 255°C < T < 305°C.",

author = "Zhao, \{X. A.\} and E. Ma and Yang, \{H. Y.\} and Nicolet, \{M. A.\}",

year = "1987",

month = oct,

day = "26",

doi = "10.1016/0040-6090(87)90198-2",

language = "英语",

volume = "153",

pages = "379--385",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "1-3",

}

TY - JOUR

T1 - Study of the initial aluminide phase growth in Al/Pt couples

AU - Zhao, X. A.

AU - Ma, E.

AU - Yang, H. Y.

AU - Nicolet, M. A.

PY - 1987/10/26

Y1 - 1987/10/26

N2 - The thermal reaction of thin platinum films with large-grained aluminum substrates is studied with emphasis on the growth kinetics of the initial aluminide phase. In situ d.c. sputter cleaning is performed on the large-grained aluminum substrates before the platinum film is evaporated to ensure a clean interface. Uniform layer-by-layer growth of Pt2Al3 is observed and monitored by 2 MeV4He+ backscattering. The thickness x of this initial aluminide phase grows parabolically with the annealing duration t as x2 = Kt. After the incubation period, the growth constant K is given by K = x2 t = 8.76exp- 1.45 eV kBT (cm2s-1) for 255°C < T < 305°C.

AB - The thermal reaction of thin platinum films with large-grained aluminum substrates is studied with emphasis on the growth kinetics of the initial aluminide phase. In situ d.c. sputter cleaning is performed on the large-grained aluminum substrates before the platinum film is evaporated to ensure a clean interface. Uniform layer-by-layer growth of Pt2Al3 is observed and monitored by 2 MeV4He+ backscattering. The thickness x of this initial aluminide phase grows parabolically with the annealing duration t as x2 = Kt. After the incubation period, the growth constant K is given by K = x2 t = 8.76exp- 1.45 eV kBT (cm2s-1) for 255°C < T < 305°C.

UR - https://www.scopus.com/pages/publications/0023437577

U2 - 10.1016/0040-6090(87)90198-2

DO - 10.1016/0040-6090(87)90198-2

M3 - 文章

AN - SCOPUS:0023437577

SN - 0040-6090

VL - 153

SP - 379

EP - 385

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-3

ER -

Study of the initial aluminide phase growth in Al/Pt couples

Abstract

Access to Document

Other files and links

Fingerprint

Cite this