Structural and optical properties of N-doped β-Ga2O 3 films deposited by RF magnetron sputtering

  • Yijun Zhang
  • , Jinliang Yan
  • , Qingshan Li
  • , Chong Qu
  • , Liying Zhang
  • , Ting Li

Research output: Contribution to journalArticlepeer-review

52 Scopus citations

Abstract

The N-doped β-Ga2O3 lms were grown on Si and quartz substrates by RF magnetron sputtering in different ammonia partial pressure ratios (from 0% to 30%). The influence of ammonia partial pressure ratios and annealing treatment on the optical and structural properties were studied. The microstructure, optical transmittance, optical absorption and optical energy gap of the N-doped β-Ga2O3 films are significantly changed with the increasing of ammonia partial pressure. The green, blue and ultraviolet emission bands are observed and discussed.

Original languageEnglish
Pages (from-to)3079-3082
Number of pages4
JournalPhysica B: Condensed Matter
Volume406
Issue number15-16
DOIs
StatePublished - Aug 2011
Externally publishedYes

Keywords

  • N-doped β-GaO
  • Optical band gap
  • Post-annealed
  • RF magnetron sputtering
  • Transparent conductive oxide

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