Abstract
The N-doped β-Ga2O3 lms were grown on Si and quartz substrates by RF magnetron sputtering in different ammonia partial pressure ratios (from 0% to 30%). The influence of ammonia partial pressure ratios and annealing treatment on the optical and structural properties were studied. The microstructure, optical transmittance, optical absorption and optical energy gap of the N-doped β-Ga2O3 films are significantly changed with the increasing of ammonia partial pressure. The green, blue and ultraviolet emission bands are observed and discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 3079-3082 |
| Number of pages | 4 |
| Journal | Physica B: Condensed Matter |
| Volume | 406 |
| Issue number | 15-16 |
| DOIs | |
| State | Published - Aug 2011 |
| Externally published | Yes |
Keywords
- N-doped β-GaO
- Optical band gap
- Post-annealed
- RF magnetron sputtering
- Transparent conductive oxide