Abstract
The warpage is dominated by laser scanning strategy to a great extent and it is a key factor leading to the loss of part accuracy in SL process. Based on the study of effects of laser power, scanning velocity and gap on cure depth and cure width, the double expose method had been used in an experiment. Moreover, the traditional method has been improved by subdividing scanning with various speeds, and an improved double expose method is proposed. It is tested that the improved method can not only reduce the warpage, but also ensure the accuracy of the prototype.
| Original language | English |
|---|---|
| Pages (from-to) | 57-60+65 |
| Journal | Hsi-An Chiao Tung Ta Hsueh/Journal of Xi'an Jiaotong University |
| Volume | 35 |
| Issue number | 1 |
| State | Published - Jan 2001 |
Keywords
- Double expose method
- Stereolithography (SL)
- Warpage