Sputtering induced by highly charged 208Pbq+ bombardment on Al surface

T. S. Wang; R. Cheng; H. B. Peng; Y. C. Han; Y. Xiang; Y. T. Zhao; G. Q. Xiao

doi:10.1016/j.surfcoat.2009.02.028

Sputtering induced by highly charged ²⁰⁸Pb^q+ bombardment on Al surface

T. S. Wang
, R. Cheng
, H. B. Peng
, Y. C. Han
, Y. Xiang
, Y. T. Zhao
, G. Q. Xiao

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Highly charged ions (HCIs) carrying high Coulomb potential energy (E_p) could cause great changes in the physical and chemical properties of material surface when they bombard on the solid surface. In our work, the secondary ion yield dependence on highly charged Pb^q+ (q = 4-36) bombardment on Al surface has been investigated. Aluminum films (99.99%) covered with a natural oxide film was chosen as our target and the kinetic energy (E_k) was varied between 80 keV and 400 keV. The yield with different incident angles could be described well by the equation developed by us. The equation consists of two parts due to the kinetic sputtering and potential sputtering. The physical interpretations of the coefficients in the said equation are discussed. Also the results on the kinetic sputtering produced by the nuclear energy loss on target surface are presented.

Original language	English
Pages (from-to)	2383-2386
Number of pages	4
Journal	Surface and Coatings Technology
Volume	203
Issue number	17-18
DOIs	https://doi.org/10.1016/j.surfcoat.2009.02.028
State	Published - 15 Jun 2009
Externally published	Yes

Keywords

Al
Highly charged ions
Potential sputtering
Secondary ion yield

Access to Document

10.1016/j.surfcoat.2009.02.028

Cite this

@article{140f57a42e16479ebbfadb74f6b78f79,

title = "Sputtering induced by highly charged 208Pbq+ bombardment on Al surface",

abstract = "Highly charged ions (HCIs) carrying high Coulomb potential energy (Ep) could cause great changes in the physical and chemical properties of material surface when they bombard on the solid surface. In our work, the secondary ion yield dependence on highly charged Pbq+ (q = 4-36) bombardment on Al surface has been investigated. Aluminum films (99.99\%) covered with a natural oxide film was chosen as our target and the kinetic energy (Ek) was varied between 80 keV and 400 keV. The yield with different incident angles could be described well by the equation developed by us. The equation consists of two parts due to the kinetic sputtering and potential sputtering. The physical interpretations of the coefficients in the said equation are discussed. Also the results on the kinetic sputtering produced by the nuclear energy loss on target surface are presented.",

keywords = "Al, Highly charged ions, Potential sputtering, Secondary ion yield",

author = "Wang, \{T. S.\} and R. Cheng and Peng, \{H. B.\} and Han, \{Y. C.\} and Y. Xiang and Zhao, \{Y. T.\} and Xiao, \{G. Q.\}",

year = "2009",

month = jun,

day = "15",

doi = "10.1016/j.surfcoat.2009.02.028",

language = "英语",

volume = "203",

pages = "2383--2386",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "17-18",

}

TY - JOUR

T1 - Sputtering induced by highly charged 208Pbq+ bombardment on Al surface

AU - Wang, T. S.

AU - Cheng, R.

AU - Peng, H. B.

AU - Han, Y. C.

AU - Xiang, Y.

AU - Zhao, Y. T.

AU - Xiao, G. Q.

PY - 2009/6/15

Y1 - 2009/6/15

N2 - Highly charged ions (HCIs) carrying high Coulomb potential energy (Ep) could cause great changes in the physical and chemical properties of material surface when they bombard on the solid surface. In our work, the secondary ion yield dependence on highly charged Pbq+ (q = 4-36) bombardment on Al surface has been investigated. Aluminum films (99.99%) covered with a natural oxide film was chosen as our target and the kinetic energy (Ek) was varied between 80 keV and 400 keV. The yield with different incident angles could be described well by the equation developed by us. The equation consists of two parts due to the kinetic sputtering and potential sputtering. The physical interpretations of the coefficients in the said equation are discussed. Also the results on the kinetic sputtering produced by the nuclear energy loss on target surface are presented.

AB - Highly charged ions (HCIs) carrying high Coulomb potential energy (Ep) could cause great changes in the physical and chemical properties of material surface when they bombard on the solid surface. In our work, the secondary ion yield dependence on highly charged Pbq+ (q = 4-36) bombardment on Al surface has been investigated. Aluminum films (99.99%) covered with a natural oxide film was chosen as our target and the kinetic energy (Ek) was varied between 80 keV and 400 keV. The yield with different incident angles could be described well by the equation developed by us. The equation consists of two parts due to the kinetic sputtering and potential sputtering. The physical interpretations of the coefficients in the said equation are discussed. Also the results on the kinetic sputtering produced by the nuclear energy loss on target surface are presented.

KW - Al

KW - Highly charged ions

KW - Potential sputtering

KW - Secondary ion yield

UR - https://www.scopus.com/pages/publications/67349220734

U2 - 10.1016/j.surfcoat.2009.02.028

DO - 10.1016/j.surfcoat.2009.02.028

M3 - 文章

AN - SCOPUS:67349220734

SN - 0257-8972

VL - 203

SP - 2383

EP - 2386

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 17-18

ER -

Sputtering induced by highly charged ²⁰⁸Pb^q+ bombardment on Al surface

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this