Special Issue for Plenary and Invited Papers from the 18th China National Conference on Plasma Science and Technology

Research output: Contribution to journal › Editorial

Original language	English
Article number	8428578
Pages (from-to)	2741
Number of pages	1
Journal	IEEE Transactions on Plasma Science
Volume	46
Issue number	8
DOIs	https://doi.org/10.1109/TPS.2018.2855839
State	Published - Aug 2018

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@article{4865c8046b8d4356b652e1149fe424ac,

title = "Special Issue for Plenary and Invited Papers from the 18th China National Conference on Plasma Science and Technology",

author = "John Verboncoeur and Chao Chang and Steven Gold and Michael Kong",

year = "2018",

month = aug,

doi = "10.1109/TPS.2018.2855839",

language = "英语",

volume = "46",

pages = "2741",

journal = "IEEE Transactions on Plasma Science",

issn = "0093-3813",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "8",

}

TY - JOUR

T1 - Special Issue for Plenary and Invited Papers from the 18th China National Conference on Plasma Science and Technology

AU - Verboncoeur, John

AU - Chang, Chao

AU - Gold, Steven

AU - Kong, Michael

PY - 2018/8

Y1 - 2018/8

UR - https://www.scopus.com/pages/publications/85051437909

U2 - 10.1109/TPS.2018.2855839

DO - 10.1109/TPS.2018.2855839

M3 - 社论

AN - SCOPUS:85051437909

SN - 0093-3813

VL - 46

SP - 2741

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 8

M1 - 8428578

ER -