Soft imprint lithography for pixel array manufacturing in OLED

Wang Chenglong; Fan Duowang; Liu Hongzhong

doi:10.1109/INOW.2007.4302995

Soft imprint lithography for pixel array manufacturing in OLED

School of Mechanical Engineering

Lanzhou Jiaotong University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

A soft imprint lithography(IL) process is presented to fabricate the pixel array pattern for organic light-emitting diodes. In this study, we successfully fabricate the OLED pixel array of sizes from 50μm to 5μm.

Original language	English
Title of host publication	2007 International Nano-Optelectronics Workshop, iNOW
Pages	288-289
Number of pages	2
DOIs	https://doi.org/10.1109/INOW.2007.4302995
State	Published - 2007
Event	International Nano-Optoelectronic Workshop, iNOW - Beijing and Lanzhou, China Duration: 29 Jul 2007 → 11 Aug 2007

Publication series

Name	2007 International Nano-Optelectronics Workshop, iNOW

Conference

Conference	International Nano-Optoelectronic Workshop, iNOW
Country/Territory	China
City	Beijing and Lanzhou
Period	29/07/07 → 11/08/07

Access to Document

10.1109/INOW.2007.4302995

Cite this

@inproceedings{e10a3c93702543e69cdce567e1b778f5,

title = "Soft imprint lithography for pixel array manufacturing in OLED",

abstract = "A soft imprint lithography(IL) process is presented to fabricate the pixel array pattern for organic light-emitting diodes. In this study, we successfully fabricate the OLED pixel array of sizes from 50μm to 5μm.",

author = "Wang Chenglong and Fan Duowang and Liu Hongzhong",

year = "2007",

doi = "10.1109/INOW.2007.4302995",

language = "英语",

isbn = "1424415918",

series = "2007 International Nano-Optelectronics Workshop, iNOW",

pages = "288--289",

booktitle = "2007 International Nano-Optelectronics Workshop, iNOW",

note = "International Nano-Optoelectronic Workshop, iNOW ; Conference date: 29-07-2007 Through 11-08-2007",

}

Chenglong, W, Duowang, F & Hongzhong, L 2007, Soft imprint lithography for pixel array manufacturing in OLED. in 2007 International Nano-Optelectronics Workshop, iNOW., 4302995, 2007 International Nano-Optelectronics Workshop, iNOW, pp. 288-289, International Nano-Optoelectronic Workshop, iNOW, Beijing and Lanzhou, China, 29/07/07. https://doi.org/10.1109/INOW.2007.4302995

TY - GEN

T1 - Soft imprint lithography for pixel array manufacturing in OLED

AU - Chenglong, Wang

AU - Duowang, Fan

AU - Hongzhong, Liu

PY - 2007

Y1 - 2007

N2 - A soft imprint lithography(IL) process is presented to fabricate the pixel array pattern for organic light-emitting diodes. In this study, we successfully fabricate the OLED pixel array of sizes from 50μm to 5μm.

AB - A soft imprint lithography(IL) process is presented to fabricate the pixel array pattern for organic light-emitting diodes. In this study, we successfully fabricate the OLED pixel array of sizes from 50μm to 5μm.

UR - https://www.scopus.com/pages/publications/47849105418

U2 - 10.1109/INOW.2007.4302995

DO - 10.1109/INOW.2007.4302995

M3 - 会议稿件

AN - SCOPUS:47849105418

SN - 1424415918

SN - 9781424415915

T3 - 2007 International Nano-Optelectronics Workshop, iNOW

SP - 288

EP - 289

BT - 2007 International Nano-Optelectronics Workshop, iNOW

T2 - International Nano-Optoelectronic Workshop, iNOW

Y2 - 29 July 2007 through 11 August 2007

ER -

Soft imprint lithography for pixel array manufacturing in OLED

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