Simple method for fabrication of microchannels in silicon carbide

By using 800-nm femtosecond laser irradiation and chemical selective etching with hydrofluoric acid, microchannels are fabricated in silicon carbide. The diameter of the microchannel is about 1.5 lm. The morphology of the channel is characterized by using scanning electronic microscopy equipped with an energy dispersive X-ray spectroscopy. The formation mechanism of silicon carbide channels is attributed to the formation of laser-induced structural change zones in silicon carbide and the reaction of the laser-induced structural change zones with hydrofluoric acid. In addition, the influences of the laser average power and scanning velocity on the position of the microchannel are discussed. VC 2015 Laser Institute of America.