Self-assembled micelle and film surface of fluorine/silicon-containing triblock copolymer

The novel fluorine/silicon-containing triblock copolymers PFMA_m-b-PMMA_n-b-PMPS_p are synthesized by poly(2,2,3,3,4,4,4,-hexafluorobutyl methacrylate)-Cl initiating methylmethacrylate (MMA) and 3-(trimethoxysilyl)propyl methacrylate (MPS). Their self-assembled micelles and the film surface are studied. The typical core-shell (CS) micelles self-assembled in tetrahydrofuran (THF), chloroform (CHCl₃), and butanone (MEK) are proved to have PFMA-core/poly(3-(trimethyoxysilyl)propyl methacrylate) PMPS/poly methylmethacrylate (PMMA)-shell structure, but have different morphlogy as 200-nm spherical CS, 190-nm half-spherical layered CS, and 340-nm multicore CS in THF, CHCl₃, and MEK, respectively. The results reveal that the migration of PFMA segments onto the film surface is strongly controlled by the micelle structures. Therefore, the film surface casted from micelles obtains low wettability (θ_a = 105–120° and θ_r = 102°–119°) and viscoelasticity (ΔD/Δf = −0.03 to −0.31×10⁻⁶ Hz⁻¹). The lowest water adsorption and viscoelastic surface is created by the spherical CS in THF, but the film casted from MEK and CHCl₃ behave rather flexible surfaces. PFMA_m-b-PMMA_n-b-PMPS_p gains high thermal stability (375 °C) and strong adhesion strength (≥54 N).