Research on rapid replication of precision manufacture

The rapid precision manufacturing for 0.1 μm or finer feature sizes lithography in integrated circuit or micro electro mechanical systems precision manufacturing is discussed. This technique avoids the conflict between lithography speed and feature size. As the same as electron-beam lithography and imprint lithography, it not only has the same ability of nano-meter manufacturing as them, but also overcomes their shortcomings. At last, it can make low cost and precise manufacturing on large area at high speed.