Pulsed X-ray source in plasma focus

Min Han; Chengmu Luo; Kechao Wang; Jinji Yang; Jinhu Xiong; Bo Yang; Mahe Liu; Shengju Li; Jingru Liu; Aici Qiu

Pulsed X-ray source in plasma focus

Min Han
, Chengmu Luo
, Kechao Wang
, Jinji Yang
, Jinhu Xiong
, Bo Yang
, Mahe Liu
, Shengju Li
, Jingru Liu
, Aici Qiu

Tsinghua University

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper the DPF-200 plasma focus device as a pulsed X-ray source has been described. The main specifications of the device are: stored energy 250 kJ, circuit inductance 50 nH, operating voltage 20-45 kv, maximum current 2.5 MA. A set of seventeen switchs of fields distortion spark gaps were parallelly used for discharge. The jetter time was 10±ns. The Mather type DPF was adopted in discharging chamber. The X-ray yield measured is 50-90 J/shot and photon energy 3-60 keV, When the pressure of H₂ gas is 533-800 Pa in chamber and stored energy is 40 kJ. The entire device was stably operated, and up to now near 10⁴ shot of DPF-200 has been conducted.

Original language	English
Pages (from-to)	461-466
Number of pages	6
Journal	Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams
Volume	7
Issue number	3
State	Published - 15 Aug 1995
Externally published	Yes

Cite this

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title = "Pulsed X-ray source in plasma focus",

abstract = "In this paper the DPF-200 plasma focus device as a pulsed X-ray source has been described. The main specifications of the device are: stored energy 250 kJ, circuit inductance 50 nH, operating voltage 20-45 kv, maximum current 2.5 MA. A set of seventeen switchs of fields distortion spark gaps were parallelly used for discharge. The jetter time was 10±ns. The Mather type DPF was adopted in discharging chamber. The X-ray yield measured is 50-90 J/shot and photon energy 3-60 keV, When the pressure of H2 gas is 533-800 Pa in chamber and stored energy is 40 kJ. The entire device was stably operated, and up to now near 104 shot of DPF-200 has been conducted.",

author = "Min Han and Chengmu Luo and Kechao Wang and Jinji Yang and Jinhu Xiong and Bo Yang and Mahe Liu and Shengju Li and Jingru Liu and Aici Qiu",

year = "1995",

month = aug,

day = "15",

language = "英语",

volume = "7",

pages = "461--466",

journal = "Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams",

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TY - JOUR

T1 - Pulsed X-ray source in plasma focus

AU - Han, Min

AU - Luo, Chengmu

AU - Wang, Kechao

AU - Yang, Jinji

AU - Xiong, Jinhu

AU - Yang, Bo

AU - Liu, Mahe

AU - Li, Shengju

AU - Liu, Jingru

AU - Qiu, Aici

PY - 1995/8/15

Y1 - 1995/8/15

N2 - In this paper the DPF-200 plasma focus device as a pulsed X-ray source has been described. The main specifications of the device are: stored energy 250 kJ, circuit inductance 50 nH, operating voltage 20-45 kv, maximum current 2.5 MA. A set of seventeen switchs of fields distortion spark gaps were parallelly used for discharge. The jetter time was 10±ns. The Mather type DPF was adopted in discharging chamber. The X-ray yield measured is 50-90 J/shot and photon energy 3-60 keV, When the pressure of H2 gas is 533-800 Pa in chamber and stored energy is 40 kJ. The entire device was stably operated, and up to now near 104 shot of DPF-200 has been conducted.

AB - In this paper the DPF-200 plasma focus device as a pulsed X-ray source has been described. The main specifications of the device are: stored energy 250 kJ, circuit inductance 50 nH, operating voltage 20-45 kv, maximum current 2.5 MA. A set of seventeen switchs of fields distortion spark gaps were parallelly used for discharge. The jetter time was 10±ns. The Mather type DPF was adopted in discharging chamber. The X-ray yield measured is 50-90 J/shot and photon energy 3-60 keV, When the pressure of H2 gas is 533-800 Pa in chamber and stored energy is 40 kJ. The entire device was stably operated, and up to now near 104 shot of DPF-200 has been conducted.

UR - https://www.scopus.com/pages/publications/0029645359

M3 - 文章

AN - SCOPUS:0029645359

SN - 1001-4322

VL - 7

SP - 461

EP - 466

JO - Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

JF - Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

IS - 3

ER -

Pulsed X-ray source in plasma focus

Abstract

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