Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure

Chunrui Ma; Chonglin Chen

doi:10.1002/9783527696406.ch1

Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure

Chunrui Ma
, Chonglin Chen

School of Materials Science and Engineering

University of Texas at San Antonio

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

17 Scopus citations

Abstract

Pulsed laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures and nanostructure due to its simple setup and it can stoichiometrically transfer a material from a solid source to a substrate to form its thin film. This chapter details the PLD setup and focus primarily on operating principle, growth mechanism and parameter of PLD for complex oxide thin film and nanostructure.

Original language	English
Title of host publication	Advanced Nano Deposition Methods
Publisher	wiley
Pages	15-45
Number of pages	31
ISBN (Electronic)	9783527696406
ISBN (Print)	9783527340255
DOIs	https://doi.org/10.1002/9783527696406.ch1
State	Published - 1 Jan 2016

Keywords

Complex oxide thin film
Mechanism of thin film growth
Nanostructure growth
Parameters in the thin film growth
Pulsed laser deposition

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10.1002/9783527696406.ch1

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abstract = "Pulsed laser deposition (PLD) is one of the most promising techniques for the formation of complex-oxide heterostructures and nanostructure due to its simple setup and it can stoichiometrically transfer a material from a solid source to a substrate to form its thin film. This chapter details the PLD setup and focus primarily on operating principle, growth mechanism and parameter of PLD for complex oxide thin film and nanostructure.",

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KW - Mechanism of thin film growth

KW - Nanostructure growth

KW - Parameters in the thin film growth

KW - Pulsed laser deposition

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Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure

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Keywords

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