Process parameters of mold fabrication for nano-imprint lithography

Yan Le; Hansong Li; Hongzhong Liu

doi:10.1109/iCECE.2010.1316

Process parameters of mold fabrication for nano-imprint lithography

Yan Le
, Hansong Li
, Hongzhong Liu

School of Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10^-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.

Original language	English
Title of host publication	Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010
Pages	5421-5424
Number of pages	4
DOIs	https://doi.org/10.1109/iCECE.2010.1316
State	Published - 2010
Event	International Conference on Electrical and Control Engineering, ICECE 2010 - Wuhan, China Duration: 26 Jun 2010 → 28 Jun 2010

Publication series

Name	Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010

Conference

Conference	International Conference on Electrical and Control Engineering, ICECE 2010
Country/Territory	China
City	Wuhan
Period	26/06/10 → 28/06/10

Keywords

Imprint lithography
PDMS
Soft mold

Access to Document

10.1109/iCECE.2010.1316

Cite this

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title = "Process parameters of mold fabrication for nano-imprint lithography",

abstract = "In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.",

keywords = "Imprint lithography, PDMS, Soft mold",

author = "Yan Le and Hansong Li and Hongzhong Liu",

year = "2010",

doi = "10.1109/iCECE.2010.1316",

language = "英语",

isbn = "9780769540313",

series = "Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010",

pages = "5421--5424",

booktitle = "Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010",

note = "International Conference on Electrical and Control Engineering, ICECE 2010 ; Conference date: 26-06-2010 Through 28-06-2010",

}

Le, Y, Li, H & Liu, H 2010, Process parameters of mold fabrication for nano-imprint lithography. in Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010., 5630313, Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010, pp. 5421-5424, International Conference on Electrical and Control Engineering, ICECE 2010, Wuhan, China, 26/06/10. https://doi.org/10.1109/iCECE.2010.1316

Process parameters of mold fabrication for nano-imprint lithography. / Le, Yan; Li, Hansong; Liu, Hongzhong.
Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010. 2010. p. 5421-5424 5630313 (Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Process parameters of mold fabrication for nano-imprint lithography

AU - Le, Yan

AU - Li, Hansong

AU - Liu, Hongzhong

PY - 2010

Y1 - 2010

N2 - In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.

AB - In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3×10-2 Pa; the curing temperature is 40 °C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.

KW - Imprint lithography

KW - PDMS

KW - Soft mold

UR - https://www.scopus.com/pages/publications/79952221979

U2 - 10.1109/iCECE.2010.1316

DO - 10.1109/iCECE.2010.1316

M3 - 会议稿件

AN - SCOPUS:79952221979

SN - 9780769540313

T3 - Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010

SP - 5421

EP - 5424

BT - Proceedings - International Conference on Electrical and Control Engineering, ICECE 2010

T2 - International Conference on Electrical and Control Engineering, ICECE 2010

Y2 - 26 June 2010 through 28 June 2010

ER -

Process parameters of mold fabrication for nano-imprint lithography

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Conference

Keywords

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