Primary and secondary discharges in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane mixtures

Sile Chen; Xingyu Chen; Jiaye Wen; Congwei Yao; Guimin Xu; Yuan Li; Zhengshi Chang; Guan Jun Zhang

doi:10.1063/1.5084000

Primary and secondary discharges in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane mixtures

Sile Chen
, Xingyu Chen
, Jiaye Wen
, Congwei Yao
, Guimin Xu
, Yuan Li
, Zhengshi Chang
, Guan Jun Zhang

School of Electrical Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

The primary and secondary discharge phenomenon in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane (CF ₄ ) mixtures is reported in this letter. The two discharges are observed one after the other in discharge current waveforms and nanosecond images. The influence of the gap distance, applied voltage, and CF ₄ volume fraction on this phenomenon is studied. According to the results, the formation reason and mechanism of the phenomenon are discussed. The primary discharge is quenched by CF ₄ molecules which have strong electron affinities. The residual species remain in the primary discharge channel, which promote the occurrence of the secondary discharge. In conclusion, the primary and secondary discharges are involved with the processes of discharge quenching and re-ignition.

Original language	English
Article number	010703
Journal	Physics of Plasmas
Volume	26
Issue number	1
DOIs	https://doi.org/10.1063/1.5084000
State	Published - 1 Jan 2019

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10.1063/1.5084000

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title = "Primary and secondary discharges in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane mixtures",

abstract = " The primary and secondary discharge phenomenon in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane (CF 4 ) mixtures is reported in this letter. The two discharges are observed one after the other in discharge current waveforms and nanosecond images. The influence of the gap distance, applied voltage, and CF 4 volume fraction on this phenomenon is studied. According to the results, the formation reason and mechanism of the phenomenon are discussed. The primary discharge is quenched by CF 4 molecules which have strong electron affinities. The residual species remain in the primary discharge channel, which promote the occurrence of the secondary discharge. In conclusion, the primary and secondary discharges are involved with the processes of discharge quenching and re-ignition.",

author = "Sile Chen and Xingyu Chen and Jiaye Wen and Congwei Yao and Guimin Xu and Yuan Li and Zhengshi Chang and Zhang, \{Guan Jun\}",

note = "Publisher Copyright: {\textcopyright} 2019 Author(s).",

year = "2019",

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doi = "10.1063/1.5084000",

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T1 - Primary and secondary discharges in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane mixtures

AU - Chen, Sile

AU - Chen, Xingyu

AU - Wen, Jiaye

AU - Yao, Congwei

AU - Xu, Guimin

AU - Li, Yuan

AU - Chang, Zhengshi

AU - Zhang, Guan Jun

PY - 2019/1/1

Y1 - 2019/1/1

N2 - The primary and secondary discharge phenomenon in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane (CF 4 ) mixtures is reported in this letter. The two discharges are observed one after the other in discharge current waveforms and nanosecond images. The influence of the gap distance, applied voltage, and CF 4 volume fraction on this phenomenon is studied. According to the results, the formation reason and mechanism of the phenomenon are discussed. The primary discharge is quenched by CF 4 molecules which have strong electron affinities. The residual species remain in the primary discharge channel, which promote the occurrence of the secondary discharge. In conclusion, the primary and secondary discharges are involved with the processes of discharge quenching and re-ignition.

AB - The primary and secondary discharge phenomenon in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane (CF 4 ) mixtures is reported in this letter. The two discharges are observed one after the other in discharge current waveforms and nanosecond images. The influence of the gap distance, applied voltage, and CF 4 volume fraction on this phenomenon is studied. According to the results, the formation reason and mechanism of the phenomenon are discussed. The primary discharge is quenched by CF 4 molecules which have strong electron affinities. The residual species remain in the primary discharge channel, which promote the occurrence of the secondary discharge. In conclusion, the primary and secondary discharges are involved with the processes of discharge quenching and re-ignition.

UR - https://www.scopus.com/pages/publications/85060738595

U2 - 10.1063/1.5084000

DO - 10.1063/1.5084000

M3 - 文章

AN - SCOPUS:85060738595

SN - 1070-664X

VL - 26

JO - Physics of Plasmas

JF - Physics of Plasmas

IS - 1

M1 - 010703

ER -

Primary and secondary discharges in an atmospheric pressure plasma jet fed with helium and tetrafluoromethane mixtures

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