Preparation of ferroelectric capacitor films onto the releasable substrate and its application to nano-transfer method

  • Masaaki Ichiki
  • , Keita Iimura
  • , Toshifumi Hosono
  • , Keisuke Kuroki
  • , Fumiaki Tomioka
  • , Tadatomo Suga
  • , Ryutaro Maeda
  • , Toshihiro Itoh

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

High dielectric capacitor, that has around 1000 in dielectric constant, can be successfully formed by nanotransfer on non-heat-resisting substrates. PZT film could be released from the Si substrate and bonded onto the polymer one. The releasing characteristics have the relationships with the thickness of Pt layer. The formed PZT has perovskite structure and clear columnar texture. The proposal of the structure of electrode using Ti is shown in case of the stress film.

Original languageEnglish
Title of host publication2010 IEEE CPMT Symposium Japan, ICSJ10
DOIs
StatePublished - 2010
Externally publishedYes
Event2010 IEEE CPMT Symposium Japan, ICSJ10 - Tokyo, Japan
Duration: 24 Aug 201026 Aug 2010

Publication series

Name2010 IEEE CPMT Symposium Japan, ICSJ10

Conference

Conference2010 IEEE CPMT Symposium Japan, ICSJ10
Country/TerritoryJapan
CityTokyo
Period24/08/1026/08/10

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