TY - JOUR
T1 - Preparation and Characterization of Laser Ablation Derived PZT Thin Films for Micro Actuators
AU - Wang, Zhan Jie
AU - Lin, Wen Mei
AU - Maeda, Ryutaro
PY - 2001
Y1 - 2001
N2 - Pb( Zr0.53Ti0.45)O3 (PZT) thin films with thickness of 1.8 ~ 2.0 μm were fabricated using laser ablation onto Pt/Ti/Si02/Si substrate. Crystalline phases in the PZT films were investigated by X-ray diffraction analysis (XRD). The microstructure and composition of the films were studied by scanning electron microscopy (SEM) and electron probe microanalysis (EPMA), respectively. The PZT films with well-crystallized perovskite phase were obtained by 20% excess PbO to the target and annealing at 750°C for 90min. The remnant polarization and the coercive field of this film were 23.6 μCm2and 60.0 kV/cm, while the dielectric constant and loss values measured at 1 kHz were approximately 935 and 0.04, respectively. The device of micro scanning beams and micro mirrors were successfully fabricated through the PZT film deposition, lithography, electron cyclotron resonance (ECR), reactive ion etching (RIE) and inductively coupled plasma (ICP) releasing processes. The scanning performed by applying AC voltages at resonance frequencies to the actuating bimorph beams.
AB - Pb( Zr0.53Ti0.45)O3 (PZT) thin films with thickness of 1.8 ~ 2.0 μm were fabricated using laser ablation onto Pt/Ti/Si02/Si substrate. Crystalline phases in the PZT films were investigated by X-ray diffraction analysis (XRD). The microstructure and composition of the films were studied by scanning electron microscopy (SEM) and electron probe microanalysis (EPMA), respectively. The PZT films with well-crystallized perovskite phase were obtained by 20% excess PbO to the target and annealing at 750°C for 90min. The remnant polarization and the coercive field of this film were 23.6 μCm2and 60.0 kV/cm, while the dielectric constant and loss values measured at 1 kHz were approximately 935 and 0.04, respectively. The device of micro scanning beams and micro mirrors were successfully fabricated through the PZT film deposition, lithography, electron cyclotron resonance (ECR), reactive ion etching (RIE) and inductively coupled plasma (ICP) releasing processes. The scanning performed by applying AC voltages at resonance frequencies to the actuating bimorph beams.
UR - https://www.scopus.com/pages/publications/0006668879
U2 - 10.1541/ieejsmas.121.124
DO - 10.1541/ieejsmas.121.124
M3 - 文章
AN - SCOPUS:0006668879
SN - 1341-8939
VL - 121
SP - 124
EP - 128
JO - IEEJ Transactions on Sensors and Micromachines
JF - IEEJ Transactions on Sensors and Micromachines
IS - 3
ER -