Parallel adjustment methods between template and substrate in nano imprint lithography

Ya Jun Zhang; Yu Gang Duan; Bing Heng Lu; Quan Dai Wang

Parallel adjustment methods between template and substrate in nano imprint lithography

Ya Jun Zhang
, Yu Gang Duan
, Bing Heng Lu
, Quan Dai Wang

School of Mechanical Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

Abstract

The principle of the nano imprint lithography and the effect of the parallelism between the template and substrate on the imprint quality are summarized. The structures and features of several nano imprint lithography stages at home and abroad are analyzed and evaluated.

Original language	English
Pages (from-to)	34-38
Number of pages	5
Journal	Weixi Jiagong Jishu/Microfabrication Technology
Issue number	2
State	Published - Jun 2005

Keywords

Flexure hinge
Imprint lithography
Stage

Cite this

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title = "Parallel adjustment methods between template and substrate in nano imprint lithography",

abstract = "The principle of the nano imprint lithography and the effect of the parallelism between the template and substrate on the imprint quality are summarized. The structures and features of several nano imprint lithography stages at home and abroad are analyzed and evaluated.",

keywords = "Flexure hinge, Imprint lithography, Stage",

author = "Zhang, \{Ya Jun\} and Duan, \{Yu Gang\} and Lu, \{Bing Heng\} and Wang, \{Quan Dai\}",

year = "2005",

month = jun,

language = "英语",

pages = "34--38",

journal = "Weixi Jiagong Jishu/Microfabrication Technology",

issn = "1003-8213",

publisher = "Weixi Jiagong Jishu",

number = "2",

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TY - JOUR

T1 - Parallel adjustment methods between template and substrate in nano imprint lithography

AU - Zhang, Ya Jun

AU - Duan, Yu Gang

AU - Lu, Bing Heng

AU - Wang, Quan Dai

PY - 2005/6

Y1 - 2005/6

N2 - The principle of the nano imprint lithography and the effect of the parallelism between the template and substrate on the imprint quality are summarized. The structures and features of several nano imprint lithography stages at home and abroad are analyzed and evaluated.

AB - The principle of the nano imprint lithography and the effect of the parallelism between the template and substrate on the imprint quality are summarized. The structures and features of several nano imprint lithography stages at home and abroad are analyzed and evaluated.

KW - Flexure hinge

KW - Imprint lithography

KW - Stage

UR - https://www.scopus.com/pages/publications/23344454935

M3 - 文章

AN - SCOPUS:23344454935

SN - 1003-8213

SP - 34

EP - 38

JO - Weixi Jiagong Jishu/Microfabrication Technology

JF - Weixi Jiagong Jishu/Microfabrication Technology

IS - 2

ER -

Parallel adjustment methods between template and substrate in nano imprint lithography

Abstract

Keywords

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