Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

Y. W. Xu; H. M. Wang

doi:10.1016/j.jallcom.2007.03.047

Oxidation behavior of γ/Mo₂Ni₃Si ternary metal silicide alloy

Y. W. Xu
, H. M. Wang

Beihang University

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

The oxidation behavior of Mo₂Ni₃Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO₂ mixed layer with continuous SiO₂ formed at its base. The continuous SiO₂ layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni²⁺. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO₃ provided rapid diffusion paths for oxygen and Ni²⁺ and deteriorated the alloy's oxidation resistance.

Original language	English
Pages (from-to)	239-243
Number of pages	5
Journal	Journal of Alloys and Compounds
Volume	457
Issue number	1-2
DOIs	https://doi.org/10.1016/j.jallcom.2007.03.047
State	Published - 12 Jun 2008
Externally published	Yes

Keywords

High temperature alloys
Intermetallics
Laser processing
X-ray diffraction

Access to Document

10.1016/j.jallcom.2007.03.047

Cite this

@article{d582e85f02894441a160d68b224cf973,

title = "Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy",

abstract = "The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.",

keywords = "High temperature alloys, Intermetallics, Laser processing, X-ray diffraction",

author = "Xu, \{Y. W.\} and Wang, \{H. M.\}",

year = "2008",

month = jun,

day = "12",

doi = "10.1016/j.jallcom.2007.03.047",

language = "英语",

volume = "457",

pages = "239--243",

journal = "Journal of Alloys and Compounds",

issn = "0925-8388",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - Oxidation behavior of γ/Mo2Ni3Si ternary metal silicide alloy

AU - Xu, Y. W.

AU - Wang, H. M.

PY - 2008/6/12

Y1 - 2008/6/12

N2 - The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.

AB - The oxidation behavior of Mo2Ni3Si based ternary metal silicide alloy toughened by small amount of nickel-base solid solution (γ) was investigated at 1173 K. The oxide scale was observed to have a duplex structure consisting of a top columnar NiO layer and an internal NiO-SiO2 mixed layer with continuous SiO2 formed at its base. The continuous SiO2 layer made a significant contribution to the low oxidation rate through preventing the diffusion of oxygen and Ni2+. While, the cracks existing in the oxide scale due to growth stress, thermal stress and volatilization of MoO3 provided rapid diffusion paths for oxygen and Ni2+ and deteriorated the alloy's oxidation resistance.

KW - High temperature alloys

KW - Intermetallics

KW - Laser processing

KW - X-ray diffraction

UR - https://www.scopus.com/pages/publications/42649088119

U2 - 10.1016/j.jallcom.2007.03.047

DO - 10.1016/j.jallcom.2007.03.047

M3 - 文章

AN - SCOPUS:42649088119

SN - 0925-8388

VL - 457

SP - 239

EP - 243

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

IS - 1-2

ER -

Oxidation behavior of γ/Mo₂Ni₃Si ternary metal silicide alloy

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this