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Optically modulated free-electron computational ghost imaging for long-working-distance surface characterization

  • Zhe Yu
  • , Jian Wang
  • , Shuming Yang
  • , Liang Gao
  • , Shiyuan Liu
  • , Jinlong Zhu
  • Huazhong University of Science and Technology
  • Optical Valley Laboratory

Research output: Contribution to journalArticlepeer-review

Abstract

Scanning electron microscopy faces a fundamental resolution-aberration trade-off, which is exacerbated in scanning ultrafast electron microscopy by the long working distances required for pump-probe integration and low electron flux. We report an optically modulated free-electron computational ghost imaging framework to overcome these constraints. By employing laser-induced ponderomotive modulation to generate structured electron illumination, we record the total secondary-electron yield via a bucket detector. Critically, spherical aberration is integrated into the forward model for wavefront engineering, rendering the system intrinsically aberration-resilient. Image reconstruction is performed using a modified stochastic gradient descent algorithm. Numerical simulations demonstrate high-fidelity surface characterization under long-working-distance and low-flux conditions, where conventional SEM performance degrades. This paradigm provides a robust pathway for high-resolution imaging in aberration-dominated and signal-starved electron microscopy platforms.

Original languageEnglish
Article number114404
JournalUltramicroscopy
Volume285
DOIs
StatePublished - Aug 2026

Keywords

  • Aberration effects
  • Computational ghost imaging
  • Low-flux imaging
  • Optically modulated electron beams
  • Surface characterization

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