Novel MEMS-based fabrication technology of micro solenoid-type inductor

Solenoid configuration of micro inductor, which has advantages of high quality factor and low loss, is needed in micro energy and power electronics applications but it is difficult to prepare using conventional microfabrication processes. In this work, we present a new microelectromechanical systems-based technology of micro solenoid-type inductor by a newly developed cylindrical projection photolithography method. Direct electroplating process of copper film on coil patterns was also successfully developed for achieving thick windings so that thick photoresist-based electroplating molds are not needed. Micro solenoid-type inductor prototypes of the winding pitch of about 40 μm, the winding number of 20 and 50, and the winding thickness of about 14 μm, were successfully fabricated on a 1 mm diameter glass capillary. The prepared 20-turn and 50-turn micro inductors were of inductance of 69 and 205 nH at 30 MHz, respectively.