@inproceedings{85ab4efc8c54416cb2719622e2f02c73,
title = "Nanoimprint of glass materials with glassy carbon mold fabricated by focused-ion-beam etching",
abstract = "The micro/nano imprinting was employed for pyrex glass and quartz glass molding and the test structures were fabricated with good fidelity of 10×10×7um and 0.3um line and space and 0.4um depth. It was found that dry etching of glasses can be used as an alternative for micro/nano structuring, but the etching rate is extremely low and the cost is too high due to the expensive reaction ion etching (RIE) facility. Focus ion beam (FIB) machining was used for micro/nano three-dimensional (3D) structuring of glassy carbon mold material. The mold for hot embossing was prepared by FIB etching and the etched depth of GC was found to increase linearly as the machining time.",
keywords = "FIB, Glassy Carbon, Hot embossing, Micro/Nano structures, Nanoimprinting, Pyrex glass",
author = "Masaharu Takahashi and Kohichi Sugimoto and Ryutaro Maeda",
year = "2004",
language = "英语",
isbn = "4990247205",
series = "Digest of Papers - Microprocesses and Nanotechnology 2004",
pages = "122--123",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2004",
note = "2004 International Microprocesses and Nanotechnology Conference ; Conference date: 26-10-2004 Through 29-10-2004",
}