@inproceedings{426c78d679264454894c83dd44581221,
title = "Nano-carbon field electron emission films synthesized by a confined-plasma chemical vapor deposition system",
abstract = "In this study, we developed a novel plasma CVD system that can generate a uniform long confined plasma column which enables us to grow the thin films on entire surface (360 0) of the long-wire or rod substrates. By means of this kind of confined plasma CVD (CPCVD), nano-carbon films have been successfully deposited on the 1000-mm-long metal wires. The as-deposited nano-carbon films present the efficient field electron emission properties.",
keywords = "CPCVD, field emission, nano-carbon, wire substrate",
author = "N. Jiang and Wang, \{H. X.\} and H. Sasaoka and K. Nishimura",
year = "2012",
doi = "10.1109/IVNC.2012.6316956",
language = "英语",
isbn = "9781467319812",
series = "Technical Digest - 25th International Vacuum Nanoelectronics Conference, IVNC 2012",
pages = "326--327",
booktitle = "Technical Digest - 25th International Vacuum Nanoelectronics Conference, IVNC 2012Om",
note = "25th International Vacuum Nanoelectronics Conference, IVNC 2012 ; Conference date: 09-07-2012 Through 13-07-2012",
}