@inproceedings{e2726ddefe2c4157bcaf5173dfa7395c,
title = "Motif parameters based characterization of line edge roughness of a nanoscale grating structure",
abstract = "Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable.",
keywords = "Line edge roughness, Motif parameters, Nanoroughness, Nanostructure",
author = "Zhuangde Jiang and Fengxia Zhao and Weixuan Jing and Prewett, \{Philip D.\} and Kyle Jiang",
year = "2010",
doi = "10.4028/www.scientific.net/KEM.437.45",
language = "英语",
isbn = "0878492739",
series = "Key Engineering Materials",
publisher = "Trans Tech Publications Ltd",
pages = "45--50",
booktitle = "Measurement Technology and Intelligent Instruments IX",
note = "9th International Symposium on Measurement Technology and Intelligent Instruments, ISMTII-2009 ; Conference date: 29-06-2009 Through 02-07-2009",
}