Morphology of Al₂O₃ film fabricated by atomic layer deposition

The surface morphology characteristics of Al₂O₃ film with thickness less than 10 nm fabricated by atomic layer deposition (ALD) were studied and 4 nm and 8 nm thick Al₂O₃ thin films were obtained by ALD. The surface morphology of the film was measured by atomic force microscopy (AFM) and scanning electron microscopy (SEM). By the least squares method and multi-fractal, the surface morphology of film was studied. Results show that the film morphology has a correlation with the principle of generated films rather than the thickness.