Modulation of columnar crystals of magnetron sputtered Ti thin films

Hongkai Zhang; Xiang Li; Jingyu Su; Xueliang Wang; Lingzhi Ma; Jiawei Xue; Yanhuai Li; Zhongxiao Song

doi:10.1016/j.tsf.2019.137512

Modulation of columnar crystals of magnetron sputtered Ti thin films

Hongkai Zhang
, Xiang Li
, Jingyu Su
, Xueliang Wang
, Lingzhi Ma
, Jiawei Xue
, Yanhuai Li
, Zhongxiao Song

School of Materials Science and Engineering

Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Ti thin films were deposited on the AlN substrates by direct-current magnetron sputtering at temperatures ranging from room temperature to 450 °C. The size of columnar crystals of Ti films first decreases and then increases, the preferred orientation plane gradually changes from the (100) plane to the (110) plane and then to (101) plane, with the increasing of the substrate temperature. And significant changes in the size of the columnar crystals are accompanied by changes in the preferred orientation plane. An improved Thornton model was proposed, the formation of the initial island, preferred growth and migration of deposited atoms act together to form columnar crystals of the Ti thin film.

Original language	English
Article number	137512
Journal	Thin Solid Films
Volume	689
DOIs	https://doi.org/10.1016/j.tsf.2019.137512
State	Published - 1 Nov 2019

Keywords

Microstructure
Preferential growth
Substrate temperature
Thin films
Titanium

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10.1016/j.tsf.2019.137512

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title = "Modulation of columnar crystals of magnetron sputtered Ti thin films",

abstract = "Ti thin films were deposited on the AlN substrates by direct-current magnetron sputtering at temperatures ranging from room temperature to 450 °C. The size of columnar crystals of Ti films first decreases and then increases, the preferred orientation plane gradually changes from the (100) plane to the (110) plane and then to (101) plane, with the increasing of the substrate temperature. And significant changes in the size of the columnar crystals are accompanied by changes in the preferred orientation plane. An improved Thornton model was proposed, the formation of the initial island, preferred growth and migration of deposited atoms act together to form columnar crystals of the Ti thin film.",

keywords = "Microstructure, Preferential growth, Substrate temperature, Thin films, Titanium",

author = "Hongkai Zhang and Xiang Li and Jingyu Su and Xueliang Wang and Lingzhi Ma and Jiawei Xue and Yanhuai Li and Zhongxiao Song",

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year = "2019",

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doi = "10.1016/j.tsf.2019.137512",

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TY - JOUR

T1 - Modulation of columnar crystals of magnetron sputtered Ti thin films

AU - Zhang, Hongkai

AU - Li, Xiang

AU - Su, Jingyu

AU - Wang, Xueliang

AU - Ma, Lingzhi

AU - Xue, Jiawei

AU - Li, Yanhuai

AU - Song, Zhongxiao

PY - 2019/11/1

Y1 - 2019/11/1

N2 - Ti thin films were deposited on the AlN substrates by direct-current magnetron sputtering at temperatures ranging from room temperature to 450 °C. The size of columnar crystals of Ti films first decreases and then increases, the preferred orientation plane gradually changes from the (100) plane to the (110) plane and then to (101) plane, with the increasing of the substrate temperature. And significant changes in the size of the columnar crystals are accompanied by changes in the preferred orientation plane. An improved Thornton model was proposed, the formation of the initial island, preferred growth and migration of deposited atoms act together to form columnar crystals of the Ti thin film.

AB - Ti thin films were deposited on the AlN substrates by direct-current magnetron sputtering at temperatures ranging from room temperature to 450 °C. The size of columnar crystals of Ti films first decreases and then increases, the preferred orientation plane gradually changes from the (100) plane to the (110) plane and then to (101) plane, with the increasing of the substrate temperature. And significant changes in the size of the columnar crystals are accompanied by changes in the preferred orientation plane. An improved Thornton model was proposed, the formation of the initial island, preferred growth and migration of deposited atoms act together to form columnar crystals of the Ti thin film.

KW - Microstructure

KW - Preferential growth

KW - Substrate temperature

KW - Thin films

KW - Titanium

UR - https://www.scopus.com/pages/publications/85071384190

U2 - 10.1016/j.tsf.2019.137512

DO - 10.1016/j.tsf.2019.137512

M3 - 文章

AN - SCOPUS:85071384190

SN - 0040-6090

VL - 689

JO - Thin Solid Films

JF - Thin Solid Films

M1 - 137512

ER -

Modulation of columnar crystals of magnetron sputtered Ti thin films

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Keywords

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