TY - GEN
T1 - Mind the Gap
T2 - 2025 IEEE/CVF International Conference on Computer Vision, ICCV 2025
AU - Liu, Yuhan
AU - Fu, Jingwen
AU - Wu, Yang
AU - Wu, Kangyi
AU - Li, Pengna
AU - Wu, Jiayi
AU - Zhou, Sanping
AU - Xin, Jingmin
N1 - Publisher Copyright:
© 2025 IEEE.
PY - 2025
Y1 - 2025
N2 - Leveraging the vision foundation models has emerged as a mainstream paradigm that improves the performance of image feature matching. However, previous works have ignored the misalignment when introducing the foundation models into feature matching. The misalignment arises from the discrepancy between the foundation models focusing on single-image understanding and the cross-image understanding requirement of feature matching. Specifically, 1) the embeddings derived from commonly used foundation models exhibit discrepancies with the optimal embeddings required for feature matching; 2) lacking an effective mechanism to leverage the single-image understanding ability into cross-image understanding. A significant consequence of the misalignment is they struggle when addressing multiinstance feature matching problems. To address this, we introduce a simple but effective framework, called IMD (Image feature Matching with a pre-trained Diffusion model) with two parts: 1) Unlike the dominant solutions employing contrastive-learning based foundation models that emphasize global semantics, we integrate the generative-based diffusion models to effectively capture instance-level details. 2) We leverage the prompt mechanism in generative model as a natural tunnel, propose a novel cross-image interaction prompting module to facilitate bidirectional information interaction between image pairs. To more accurately measure the misalignment, we propose a new benchmark called IMIM, which focuses on multi-instance scenarios. Our proposed IMD establishes a new state-of-the-art in commonly evaluated benchmarks, and the superior improvement 12% in IMIM indicates our method efficiently mitigates the misalignment.
AB - Leveraging the vision foundation models has emerged as a mainstream paradigm that improves the performance of image feature matching. However, previous works have ignored the misalignment when introducing the foundation models into feature matching. The misalignment arises from the discrepancy between the foundation models focusing on single-image understanding and the cross-image understanding requirement of feature matching. Specifically, 1) the embeddings derived from commonly used foundation models exhibit discrepancies with the optimal embeddings required for feature matching; 2) lacking an effective mechanism to leverage the single-image understanding ability into cross-image understanding. A significant consequence of the misalignment is they struggle when addressing multiinstance feature matching problems. To address this, we introduce a simple but effective framework, called IMD (Image feature Matching with a pre-trained Diffusion model) with two parts: 1) Unlike the dominant solutions employing contrastive-learning based foundation models that emphasize global semantics, we integrate the generative-based diffusion models to effectively capture instance-level details. 2) We leverage the prompt mechanism in generative model as a natural tunnel, propose a novel cross-image interaction prompting module to facilitate bidirectional information interaction between image pairs. To more accurately measure the misalignment, we propose a new benchmark called IMIM, which focuses on multi-instance scenarios. Our proposed IMD establishes a new state-of-the-art in commonly evaluated benchmarks, and the superior improvement 12% in IMIM indicates our method efficiently mitigates the misalignment.
UR - https://www.scopus.com/pages/publications/105044165078
U2 - 10.1109/ICCV51701.2025.01889
DO - 10.1109/ICCV51701.2025.01889
M3 - 会议稿件
AN - SCOPUS:105044165078
T3 - Proceedings of the IEEE International Conference on Computer Vision
SP - 20313
EP - 20323
BT - Proceedings - 2025 IEEE/CVF International Conference on Computer Vision, ICCV 2025
PB - Institute of Electrical and Electronics Engineers Inc.
Y2 - 19 October 2025 through 23 October 2025
ER -