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Microstructural and Electron-Emission Characteristics of Nb-Si-N Films in Surface-Conduction Electron-Emitter Display

  • Huiyan Wu
  • , Jianfeng Wang
  • , Zhongxiao Song
  • , Shengli Wu
  • , Yanhuai Li
  • , Siliang Xiong
  • , Kewei Xu
  • , Chunliang Liu
  • Xi'an Jiaotong University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

We proposed ternary nitride Nb-Si-N film as a promising surface-conduction electron emitter (SCE) in surface-conduction electron-emitter display (SED). Nb-Si-N films consisted of continuous NbN polycrystalline phase with (Si3-xNb4x)N4 amorphous phase in NbN grain boundaries. After electroforming, serrated nanogaps were observed in Nb-Si-N SCE strips. The emission current of Nb-Si-N SCE array of 1×18 cells was 6.50 μA with anode voltage of 1.5 kV and device voltage of 22 V, indicating satisfying potential for display applications comparing with NbN SCEs.

Original languageEnglish
Title of host publication18th International Vacuum Congress, IVC 2010
EditorsFeng Pan, Xu Chen
PublisherElsevier B.V.
Pages139-143
Number of pages5
ISBN (Electronic)9781627487481
DOIs
StatePublished - 2012
Event18th International Vacuum Congress, IVC 2010 - Beijing, China
Duration: 23 Aug 201027 Aug 2010

Publication series

NamePhysics Procedia
Volume32
ISSN (Print)1875-3884
ISSN (Electronic)1875-3892

Conference

Conference18th International Vacuum Congress, IVC 2010
Country/TerritoryChina
CityBeijing
Period23/08/1027/08/10

Keywords

  • Nb-Si-N
  • Surface conduction electron-emitter display
  • electroforming
  • microstructure

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