TY - GEN
T1 - Measurement study of residual stress on tungsten-rhenium thin film thermocouples by nanoindentation technology
AU - Tian, Bian
AU - Yu, Qiuyue
AU - Zhang, Zhongkai
AU - Lin, Qijing
AU - Zhao, Na
AU - Jing, Weixuan
AU - Jiang, Zhuangde
N1 - Publisher Copyright:
© 2017 IEEE.
PY - 2017/8/25
Y1 - 2017/8/25
N2 - In this paper, Nano-indentation technology is used to test the mechanical property of the tungsten-rhenium thin film, including hardness, elastic modulus and residual stress. The effects of different heat treatment temperature and different substrates on the hardness and elastic modulus of tungsten-rhenium films were studied. We research three substrates which are silicon carbide ceramic, aluminum oxide ceramic and zirconium oxide ceramic. Test results show that the tungsten-rhenium films on aluminum oxide ceramic shows the biggest values of elastic modulus and the smallest on silicon carbide ceramic. However, value of hardness is biggest on zirconium oxide ceramic and smallest on aluminum oxide ceramic. Besides, the heat treatment temperature has high influence on hardness and elastic modulus of tungsten-rhenium film. And under different substrates, the hardness and elastic modulus of film on zirconium oxide ceramic is the most sensitive to heat treatment temperature. By contrast, silicon carbide ceramic is the least.
AB - In this paper, Nano-indentation technology is used to test the mechanical property of the tungsten-rhenium thin film, including hardness, elastic modulus and residual stress. The effects of different heat treatment temperature and different substrates on the hardness and elastic modulus of tungsten-rhenium films were studied. We research three substrates which are silicon carbide ceramic, aluminum oxide ceramic and zirconium oxide ceramic. Test results show that the tungsten-rhenium films on aluminum oxide ceramic shows the biggest values of elastic modulus and the smallest on silicon carbide ceramic. However, value of hardness is biggest on zirconium oxide ceramic and smallest on aluminum oxide ceramic. Besides, the heat treatment temperature has high influence on hardness and elastic modulus of tungsten-rhenium film. And under different substrates, the hardness and elastic modulus of film on zirconium oxide ceramic is the most sensitive to heat treatment temperature. By contrast, silicon carbide ceramic is the least.
KW - Residual stress
KW - Temperature sensor
KW - TFTCs
UR - https://www.scopus.com/pages/publications/85018493175
U2 - 10.1109/NEMS.2017.8017139
DO - 10.1109/NEMS.2017.8017139
M3 - 会议稿件
AN - SCOPUS:85018493175
T3 - 2017 IEEE 12th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017
SP - 800
EP - 803
BT - 2017 IEEE 12th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017
Y2 - 9 April 2017 through 12 April 2017
ER -