@inproceedings{fb47891bf64143b6acc1c967824b5757,
title = "Measurement of linewidth for nano-scale lines prepared by multilayer thin films",
abstract = "One-dimensional lines with nanometer scale are prepared by using multilayer thin films deposition technique. The Ti/SiO2 multilayer thin films are systematically deposited on silicon substrates in the conventional electron-beam evaporation system. Then a single nanometer scale line can be obtained on the cleaved cross-section of one multilayer thin films structure. The linewidth has been measured by analyzing top-down scanning electron microscope (SEM) images on-line and the linewidth measured is less than 20 nm. In addition, off-line analysis of these images based on image processing technique is performed to measure linewidth accurately. The edges of nanometer lines are detected by image processing and analysis technique. A nanoscale linewidth measurement method based on image processing and analysis technique was put forward.",
keywords = "Image segmentation, Linewidth, Multilayer thin films, Scanning electrochemical microscopy",
author = "Han, \{Guo Q.\} and Jiang, \{Zhuang D.\} and Jing, \{Wei X.\} and Zhu, \{Ming Z.\} and Zhao, \{Yu L.\}",
year = "2007",
doi = "10.1109/NEMS.2007.352110",
language = "英语",
isbn = "1424406102",
series = "Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007",
pages = "683--686",
booktitle = "Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007",
note = "2007 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2007 ; Conference date: 16-01-2007 Through 19-01-2007",
}