Skip to main navigation Skip to search Skip to main content

Mark image geometric distortion calibration in alignment system for multilevel imprint lithography

  • Xi'an Jiaotong University

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

A distortion model based on cubic polynomial is established concerning various linear and nonlinear distortions in the alignment system based on video image for multi-level imprint lithography and a calibration technique based on controlled points is adopted to solve the model. By minimizing the error object function, the indeterminate coefficients of the distortion model are obtained. The calibration results are evaluated by the standard deviation of calibration error, and the results show that the fitting error is 0.22 μm. By introducing distortion correction based on this model, the alignment error due to image geometric distortion in the alignment system is reduced from 2.5 μm to 0.25 μm, which meets the requirement of precise positioning of alignment marks.

Original languageEnglish
Pages (from-to)422-427
Number of pages6
JournalGuangxue Jingmi Gongcheng/Optics and Precision Engineering
Volume15
Issue number3
StatePublished - Mar 2007

Keywords

  • Alignment
  • Calibration
  • Image distortion
  • Imprint lithography

Fingerprint

Dive into the research topics of 'Mark image geometric distortion calibration in alignment system for multilevel imprint lithography'. Together they form a unique fingerprint.

Cite this