LiF/AlO as Dielectrics for MOSFET on Single Crystal Hydrogen-Terminated Diamond

  • Yan Feng Wang
  • , Wei Wang
  • , Haris Naeem Abbasi
  • , Xiaohui Chang
  • , Xiaofan Zhang
  • , Tianfei Zhu
  • , Zhangcheng Liu
  • , Wangzhen Song
  • , Genqiang Chen
  • , Hong Xing Wang

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Abstract

Fabrication of single crystal hydrogen-terminated diamond MOSFET with dielectrics of LiF/Al2O3 has been successfully carried out. After patterning source and drain electrodes, 60nm LiF/ 20nm Al2O3 were deposited as dielectrics. The output and transfer characteristics were investigated, indicating the typical p-type channel MOSFET. The on/off ratio was ∼ 109 , which was high enough for practical applications. The fixed and trapped charge in LiF/Al2O3 were also examined. Based on the capacitance-voltage curves, the dielectric constant of LiF/Al2O3 was calculated to be 36.1, which was ascribed to the LiF supercapacitor structure. To the best of our knowledge, this LiF supercapacitor structure was first used in hydrogen-terminated diamond MOSFET to improve the dielectric constant.

Original languageEnglish
Article number9076687
Pages (from-to)808-811
Number of pages4
JournalIEEE Electron Device Letters
Volume41
Issue number6
DOIs
StatePublished - 1 Jun 2020

Keywords

  • Diamond
  • LiF/Al₂O₃
  • MOSFET
  • supercapacitor

Fingerprint

Dive into the research topics of 'LiF/AlO as Dielectrics for MOSFET on Single Crystal Hydrogen-Terminated Diamond'. Together they form a unique fingerprint.

Cite this