Lateral Epitaxy of Atomically Sharp WSe2/WS2Heterojunctions on Silicon Dioxide Substrates

Jianyi Chen; Wu Zhou; Wei Tang; Bingbing Tian; Xiaoxu Zhao; Hai Xu; Yanpeng Liu; Dechao Geng; Sherman Jun Rong Tan; Wei Fu; Kian Ping Loh

doi:10.1021/acs.chemmater.6b03639

Lateral Epitaxy of Atomically Sharp WSe₂/WS₂Heterojunctions on Silicon Dioxide Substrates

Jianyi Chen
, Wu Zhou
, Wei Tang
, Bingbing Tian
, Xiaoxu Zhao
, Hai Xu
, Yanpeng Liu
, Dechao Geng
, Sherman Jun Rong Tan
, Wei Fu
, Kian Ping Loh

Research output: Contribution to journal › Article › peer-review

69 Scopus citations

Original language	English
Pages (from-to)	7194-7197
Number of pages	4
Journal	Chemistry of Materials
Volume	28
Issue number	20
DOIs	https://doi.org/10.1021/acs.chemmater.6b03639
State	Published - 25 Oct 2016
Externally published	Yes

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10.1021/acs.chemmater.6b03639

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@article{054999f5153446ceb660ce5697648ab8,

title = "Lateral Epitaxy of Atomically Sharp WSe2/WS2Heterojunctions on Silicon Dioxide Substrates",

author = "Jianyi Chen and Wu Zhou and Wei Tang and Bingbing Tian and Xiaoxu Zhao and Hai Xu and Yanpeng Liu and Dechao Geng and Tan, \{Sherman Jun Rong\} and Wei Fu and Loh, \{Kian Ping\}",

year = "2016",

month = oct,

day = "25",

doi = "10.1021/acs.chemmater.6b03639",

language = "英语",

volume = "28",

pages = "7194--7197",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

number = "20",

}

TY - JOUR

T1 - Lateral Epitaxy of Atomically Sharp WSe2/WS2Heterojunctions on Silicon Dioxide Substrates

AU - Chen, Jianyi

AU - Zhou, Wu

AU - Tang, Wei

AU - Tian, Bingbing

AU - Zhao, Xiaoxu

AU - Xu, Hai

AU - Liu, Yanpeng

AU - Geng, Dechao

AU - Tan, Sherman Jun Rong

AU - Fu, Wei

AU - Loh, Kian Ping

PY - 2016/10/25

Y1 - 2016/10/25

UR - https://www.scopus.com/pages/publications/84992626253

U2 - 10.1021/acs.chemmater.6b03639

DO - 10.1021/acs.chemmater.6b03639

M3 - 文章

AN - SCOPUS:84992626253

SN - 0897-4756

VL - 28

SP - 7194

EP - 7197

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 20

ER -

Lateral Epitaxy of Atomically Sharp WSe2/WS2Heterojunctions on Silicon Dioxide Substrates

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Lateral Epitaxy of Atomically Sharp WSe₂/WS₂Heterojunctions on Silicon Dioxide Substrates