TY - JOUR
T1 - Integrated modeling of plasma-dielectric interaction
T2 - Kinetic boundary effects
AU - Sun, Guang Yu
AU - Li, Yuan
AU - Zhang, Shu
AU - Song, Bai Peng
AU - Mu, Hai Bao
AU - Guo, Bao Hong
AU - Sun, An Bang
AU - Zhang, Guan Jun
N1 - Publisher Copyright:
© 2019 IOP Publishing Ltd.
PY - 2019/5/1
Y1 - 2019/5/1
N2 - Kinetic effects of plasma-dielectric interaction are studied theoretically with respect to the mechanisms of electron extraction from solids in response to ion and electron bombardment, coupled with plasma dynamics of a weakly emissive sheath. Emission coefficients of incident beams are first calculated by quantum mechanical as well as semi-classical approaches involving Auger neutralization, energy-dependent ejection due to primary beam, and reflection of low-energy electrons, which are then incorporated into a 1D1V simulation and plasma kinetic theory. Presheath with sheath structures are derived using fluid and kinetic theory regarding ion-induced emission, respectively. The Bohm criterion considering surface emission is evaluated as well. For electron-induced emission, it is found that sheath potential is no longer collinear with plasma electron temperature in our integrated model. Additionally, reflection of low-energy electrons is justified to have a minor impact on the floating sheath for low temperature half-bounded plasma under low pressure. The combined effects of both incident ions and electrons in bounded plasma are analyzed with symmetrical/asymmetrical emission yields at two boundaries. It is then proved that wall potential is barely affected by bulk plasma influx if emission coefficients are symmetrical, while emission due to transiting beam can drastically modify the sheath solution. Electron reflection also becomes more influential if secondary electrons have low initial energy. Finally, we summarize different roles of ion and electron in sheath structure. It is shown that ion-induced emission mitigates sheath potential but cannot reach critical emission on contrast to that of electron flux.
AB - Kinetic effects of plasma-dielectric interaction are studied theoretically with respect to the mechanisms of electron extraction from solids in response to ion and electron bombardment, coupled with plasma dynamics of a weakly emissive sheath. Emission coefficients of incident beams are first calculated by quantum mechanical as well as semi-classical approaches involving Auger neutralization, energy-dependent ejection due to primary beam, and reflection of low-energy electrons, which are then incorporated into a 1D1V simulation and plasma kinetic theory. Presheath with sheath structures are derived using fluid and kinetic theory regarding ion-induced emission, respectively. The Bohm criterion considering surface emission is evaluated as well. For electron-induced emission, it is found that sheath potential is no longer collinear with plasma electron temperature in our integrated model. Additionally, reflection of low-energy electrons is justified to have a minor impact on the floating sheath for low temperature half-bounded plasma under low pressure. The combined effects of both incident ions and electrons in bounded plasma are analyzed with symmetrical/asymmetrical emission yields at two boundaries. It is then proved that wall potential is barely affected by bulk plasma influx if emission coefficients are symmetrical, while emission due to transiting beam can drastically modify the sheath solution. Electron reflection also becomes more influential if secondary electrons have low initial energy. Finally, we summarize different roles of ion and electron in sheath structure. It is shown that ion-induced emission mitigates sheath potential but cannot reach critical emission on contrast to that of electron flux.
KW - emissive plasma sheath
KW - kinetic theory
KW - plasma-dielectric interface
KW - plasma-surface interaction
KW - secondary electron emission
UR - https://www.scopus.com/pages/publications/85070252533
U2 - 10.1088/1361-6595/ab17a3
DO - 10.1088/1361-6595/ab17a3
M3 - 文章
AN - SCOPUS:85070252533
SN - 0963-0252
VL - 28
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
IS - 5
M1 - 055001
ER -